2007
DOI: 10.1149/1.2795610
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Kinetics Mechanism of Copper UPD Nucleation and Growth on Mono and Polycrystaline Gold

Abstract: The copper electrodeposition process was studied onto different gold substrates, single crystal (111) and polycrystalline, using chronoamperometry. The potentiostatic current transients were analysed; it was found that, in both cases, different electrodeposition processes take place. In the underpotential region, the transients involve three types of processes, one of adsorption and two nucleation ones limited by the incorporation of ad-atoms, thus giving bidimensional growth for both electrodes.

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Cited by 5 publications
(3 citation statements)
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“…For t > 0.03 s, the shape of transient supported the formation and growth of 2D nuclei, limited by ad-atom incorporation. As it could be seen in Figure6(a→b), a current decrease appeared in Cu monolayer formation, and a current increase was observed by Cu and S co-deposited Au electrode (b→c) similar to literature[26]. As a result, chronoamperometry process of CuS layer proceeded by a two-step mechanism involving Langmuir-type adsorption accompanied by nucleation and two dimensional growth, and Cu deposition was determined by the Hölzle model (jtotal = jAD + j2D) in which the electrodeposition process (jtotal) was the linear sum of a Langmuirtype adsorption term (jAD) and a 2D nucleation process (j2D).…”
supporting
confidence: 86%
See 1 more Smart Citation
“…For t > 0.03 s, the shape of transient supported the formation and growth of 2D nuclei, limited by ad-atom incorporation. As it could be seen in Figure6(a→b), a current decrease appeared in Cu monolayer formation, and a current increase was observed by Cu and S co-deposited Au electrode (b→c) similar to literature[26]. As a result, chronoamperometry process of CuS layer proceeded by a two-step mechanism involving Langmuir-type adsorption accompanied by nucleation and two dimensional growth, and Cu deposition was determined by the Hölzle model (jtotal = jAD + j2D) in which the electrodeposition process (jtotal) was the linear sum of a Langmuirtype adsorption term (jAD) and a 2D nucleation process (j2D).…”
supporting
confidence: 86%
“…Current-time transients from chronoamperometry experiments are compared with the theoretical models to characterize the type of nucleation for deposits [25]. In order to describe totally the shape of the transients, the model (jtotal = jAD + j2D) explored by Hölzle et al is used where the overall current density for the electrodeposition process (jtotal) is the linear sum of a Langmuir-type adsorption term (jAD) and a 2D nucleation process (j2D) [26].…”
Section: Kinetics Of the Electrodepositions Of Cus And Znsmentioning
confidence: 99%
“…First, it has been shown that at high overpotential values, the hydrogen evolution reaction can change the hydrodynamic conditions near the electrode (due to the production of hydrogen bubbles) and lead to the formation of copper micro/nanostructures presenting a rough surface [45,[63][64][65]. The overpotential values recorded for electrodepositions under CH at 60 °C being significantly higher than at room temperature, this could explain the rough surfaces and poorly crystalline morphology of copper particles obtained in such conditions.…”
Section: Discussionmentioning
confidence: 99%