Kinetics and mechanism of the shock induced thermal decomposition of <i>n</i>‐propylsilane

Sawrey, B. A.; O’Neal, H. E.; Ring, M. A.; Coffey, Dewitt

doi:10.1002/kin.550160703

Cited by 21 publications

(11 citation statements)

References 11 publications

(3 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…This can be interpreted in terms of a normal deuterium isotope rate effect for methylsilane of about 10-20%. This is also in fairly good agreement with our shock-tube results [2].…”

Section: Primary Dissociation Process Observationssupporting

confidence: 92%

The gas‐phase decomposition of methylsilane. Part II. Mechanisms of decomposition under static system conditions

Sawrey

O’Neal

Ring

1984

Int J of Chemical Kinetics

Self Cite

View full text Add to dashboard Cite

The static system pyrolysis of methylsilane ( T -700 K, PT -150 torr), pure and in the presence of ethylene, propylene, and acetylene, has been investigated. It is proposed that in the uninhibited system, the major products (silane and dimethylsilane) are produced by free radical processes, and that the free radicals are formed at the walls from methylsilylenes. In the presence of olefins, the free radicals are trapped to form methylsilane adducts. In acetylene, ,trapping of methylsilylenes prevents free radical production and eliminates the free radical produced products of the pure and the olefin inhibited systems. Rates of initiation correlate with rates of reactant loss in acetylene inhibited systems, and with rates of hydrogen formation in olefin inhibited systems. Rough estimates of primary dissociation process yields give for the 1,l-Hn elimination z 0.78, for the 1,2-H elimination 91,~ z 0.16, and for the methane elimination ~$ c H~ 0.06 at 700 K. Deuteration lowers initial step kinetics by about 15%.

show abstract

“…This can be interpreted in terms of a normal deuterium isotope rate effect for methylsilane of about 10-20%. This is also in fairly good agreement with our shock-tube results [2].…”

Section: Primary Dissociation Process Observationssupporting

confidence: 92%

The gas‐phase decomposition of methylsilane. Part II. Mechanisms of decomposition under static system conditions

Sawrey

O’Neal

Ring

1984

Int J of Chemical Kinetics

Self Cite

View full text Add to dashboard Cite

show abstract

“…The results from the pyrolysis of monomethylsilane showed that, out of the three elimination channels, i.e., 1,1-H 2 , 1,2-H 2 , and CH 4 elimination, the dissociation yield to eliminate CH 4 only accounted for 6%. 31,34,35 According to Haas and Ring, 35 the reaction of :SiH 2 with C 2 H 2 forms silylacetylene (HCCSiH 3 ) either by direct insertion of:SiH 2 into a C-H bond or by addition to the C-C triple bond to form silacyclopropene. In order to determine the main contributor to the formation of methane, we calculated the amount of methane produced when using 4.0 Torr of TriMS.…”

Section: A Formation Of Methane and Other Small Hydrocarbon Moleculesmentioning

confidence: 99%

“…Ethene 31,34,36-38 and propene 31,34 are known to be good free radical scavengers. Ethene 31,34,36-38 and propene 31,34 are known to be good free radical scavengers.…”

Section: Radical Recombination Reactionsmentioning

confidence: 99%

Effect of trimethylsilane pressure on hot-wire chemical vapor deposition chemistry using vacuum ultraviolet laser ionization mass spectrometry

Toukabri

Shi

2013

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

View full text Add to dashboard Cite

Detecting free radicals during the hot wire chemical vapor deposition of amorphous silicon carbide films using single-source precursors J. Vac. Sci. Technol. A 24, 542 (2006); 10.1116/1.2194023 Vacuum ultraviolet mass-analyzed threshold ionization spectroscopy of hexafluorobenzene: The Jahn-Teller effect and vibrational analysisIn this study, the authors investigated the effect of sample pressure on the reaction chemistry of trimethylsilane (TriMS) in the hot-wire chemical vapor deposition (CVD) process. The secondary gasphase reaction products were examined in a reactor with varying TriMS pressures. The reaction products were analyzed using a laser ionization source with a vacuum ultraviolet wavelength of 118 nm, coupled with mass spectrometry. By increasing TriMS pressure, methane formation was observed. To our knowledge, this is the first successful use of either open-chain alkylsilanes or four-membered-ring (di)silacyclobutane molecules as an independent precursor gas in the hot-wire CVD reactor to achieve methane formation. Our results showed that methane was formed mainly from the radical chain reactions with minor contributions from molecular elimination. The increase in the sample pressure also led to the formation of other small hydrocarbon molecules including acetylene, ethene, propyne, and propene. The formation of hydrogen molecules was enhanced when the sample pressure was increased. In addition, the change in the sample pressure had a direct effect on the radical recombination and disproportionation reactions. This is reflected in the different behavior assumed by the main products from these two types of reactions, i.e., tetramethylsilane, hexamethyldisilane from the former, and three methyl-substituted disilacyclobutanes from the latter. The trapping of free radicals resulting from the in-situ produced ethene and propene molecules is responsible for the observed difference.

show abstract

“…refs. 23,24) and molecular cleavage into methylsilane and methylsilanone, this reaction having its prototype in IR laser-induced decomposition of disiloxane H 3 SiOSiH 3 (ref. 25).…”

Section: Decomposition Mechanismmentioning

confidence: 99%

IR laser-induced decomposition of 1,3–dimethyldisiloxane for chemical vapour deposition of nano-structured methyl(hydrido)silicone phases

et al. 2000

View full text Add to dashboard Cite

Kinetics and mechanism of the shock induced thermal decomposition of n‐propylsilane

Abstract: The kinetics and mechanism of the thermal decomposition of n-propylsilane have been studied by the single pulse shock tube-comparative rate technique a t pressures

Cited by 21 publications

References 11 publications

The gas‐phase decomposition of methylsilane. Part II. Mechanisms of decomposition under static system conditions

The gas‐phase decomposition of methylsilane. Part II. Mechanisms of decomposition under static system conditions

Effect of trimethylsilane pressure on hot-wire chemical vapor deposition chemistry using vacuum ultraviolet laser ionization mass spectrometry

IR laser-induced decomposition of 1,3–dimethyldisiloxane for chemical vapour deposition of nano-structured methyl(hydrido)silicone phases

Contact Info

Product

Resources

About