Kinetic Roughening in Polymer Film Growth by Vapor Deposition

Zhao, Yiping; Fortin, Jeffrey B.; Bonvallet, G.; Wang, G.-C.; Lu, Toh‐Ming

doi:10.1103/physrevlett.85.3229

Cited by 86 publications

(78 citation statements)

References 10 publications

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“…29 Additional support for this explanation can be found in the experiments on polymer films grown by vapor deposition. For this system, in which ͑nonlocal͒ bulk diffusion was proved to play a key role, anomalous scaling was indeed observed; 32 in other words, it seems that nonlocality may play a crucial role in anomalous scaling systems.…”

Section: Discussionmentioning

confidence: 66%

“…29 Former studies suggest that anomalous scaling was also present for the physical and chemical vapor deposition of metals 30,31 and polymer films prepared by vapor deposition. 32 Finally, superrough anomalous behavior was described for Pt sputtered films under simultaneous substrate rotation. 16 Although there is no well-established theory of anomalous scaling, some recent studies suggest that it must be due to nonlocal effects in the surface dynamics.…”

Section: Discussionmentioning

confidence: 99%

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Intrinsic anomalous surface roughening of TiN films deposited by reactive sputtering

et al. 2006

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We study surface kinetic roughening of TiN films grown on Si͑100͒ substrates by dc reactive sputtering. The surface morphology of films deposited for different growth times under the same experimental conditions were analyzed by atomic force microscopy. The TiN films exhibit intrinsic anomalous scaling and multiscaling. The film kinetic roughening is characterized by a set of local exponent values ␣ loc = 1.0 and ␤ loc = 0.39, and global exponent values ␣ = 1.7 and ␤ = 0.67, with a coarsening exponent of 1 / z = 0.39. These properties are correlated to the local height-difference distribution function obeying power-law statistics. We associate this intrinsic anomalous scaling with the instability due to nonlocal shadowing effects that take place during thin-film growth by sputtering.

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Section: Discussionmentioning

confidence: 66%

Section: Discussionmentioning

confidence: 99%

Intrinsic anomalous surface roughening of TiN films deposited by reactive sputtering

et al. 2006

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“…Previous work has suggested that the deposition pressure should be less than 100 mTorr for obtaining highquality dense films, (27,28) and a kinetic model for Parylene surface roughening has also been reported. (29) The relationship between the surface morphology and the deposition conditions of Parylene-C was studied.…”

Section: Effect Of Dimer Sublimation Rate On Surface Morphologymentioning

confidence: 99%

Effect of Thermal and Deposition Processes on Surface Morphology, Crystallinity, and Adhesion of Parylene-C

Hsu

Rieth

Kammer

et al. 2008

Sensors and Materials

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Neural interface devices have been developed for neural science and neuroprosthetics applications to record and stimulate neural signals. Chemical-vapor-deposited Parylene-C films were studied as an encapsulation material for such an implantable device. The surface morphology of an implant affects its biocompatibility; thus, the Parylene-C surface morphology was investigated as a function of the precursor sublimation rate by atomic force microscopy. We found that high precursor sublimation rates resulted in slightly higher root-mean-square surface roughnesses (from 5.78 to 9.53 nm for deposition rates from 0.015 to 0.08 g/min). The crystallinity affects the physical properties of semicrystalline polymers, and various heat treatments were found to modify the crystallinity of Parylene-C films, as assessed by X-ray diffraction (XRD). The XRD peak at 2θ = ~14.5° increased in intensity and decreased in full width at half maximum with increasing annealing temperature, indicating an increase in film crystallinity. Poor adhesion would compromise the protection offered by Parylene-C coatings. The adhesion between Parylene-C and silicon, amorphous silicon carbide, and boron silicate glass substrates were evaluated using the standard tape adhesion test from the American Society for Testing and Materials (ASTM) in an attempt to minimize the occurrence of delamination failures. The tape adhesion tests indicated strong adhesion for all the as-deposited Parylene films with the application of an adhesion promoter (Silquest A-174 ® silane). However, annealing the deposited films at temperatures from 85 to 150°C in air for 20 min reduced film adhesion, and also the adhesion testing procedure used significantly affects the results obtained. Supporting evidence suggested that the thermal stress generated in the films weakened the adhesive force. We concluded that 88 Sensors and Materials, Vol. 20, No. 2 (2008) the Parylene-C film properties (surface morphology, crystallinity, and adhesion) changed during deposition and thermal annealing, suggesting that the Parylene-C film properties can be tailored and that, with care, failure due to film delamination can be avoided.

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“…The parameters and are related to the film thickness, D, according to the power laws ϰ D ␤ and ϰ D 1/z . 5,14 The correlation length, , at each thickness was determined by fitting the HDCF to the following analytical function: g͑R͒ =2…”

mentioning

confidence: 99%

Growth dynamics of C60 thin films: Effect of molecular structure

Yim

Jones

2009

Applied Physics Letters

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The surface morphology and growth behavior of fullerene thin films have been studied by atomic force microscopy and height difference correlation function analysis. In contrast to the large growth exponents (β) previously reported for other organic semiconductor thin-film materials, a relatively small β value of 0.39±0.10 was determined. Simulations of (1+1)-dimensional surface lateral diffusion models indicate that the evolution of deep grain boundaries leads to a rapid increase in β. We suggest that the commonly observed large β values for organic thin films are due to their intrinsically anisotropic molecular structures and hence different stacking directions between crystallite domains.

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Kinetic Roughening in Polymer Film Growth by Vapor Deposition

Cited by 86 publications

References 10 publications

Intrinsic anomalous surface roughening of TiN films deposited by reactive sputtering

Intrinsic anomalous surface roughening of TiN films deposited by reactive sputtering

Effect of Thermal and Deposition Processes on Surface Morphology, Crystallinity, and Adhesion of Parylene-C

Growth dynamics of C60 thin films: Effect of molecular structure

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