1995
DOI: 10.1088/0963-0252/4/4/012
|View full text |Cite
|
Sign up to set email alerts
|

Kinetic processes in a highly-ionized non-equilibrium hydrogen plasma

Abstract: The work represents a ramified kinetic scheme of plasma chemical processes in a non-equilibrium hydrogen plasma that allows one to model in detail the dynamics of an electric discharge in a molecular gas. The scheme describes processes of interaction of electrons with heavy particles (including a vast set of processes of electronic-vibrational excitation of hydrogen molecules by electron impact), vibrational kinetics of the H2 molecules and processes with participation of hydrogen atoms, positive and negative … Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

0
99
1

Year Published

2005
2005
2023
2023

Publication Types

Select...
6
3

Relationship

0
9

Authors

Journals

citations
Cited by 79 publications
(101 citation statements)
references
References 50 publications
0
99
1
Order By: Relevance
“…Many studies have also been devoted to the atomic hydrogen produced in these plasmas, which is of relevance for film deposition processes. [5][6][7][8] The dynamics of internally excited states of H 2 [9][10][11][12][13][14][15][16][17][18] and its close relationship to the production of H -ions by dissociative electron attachment have been also addressed by various groups. [19][20][21] Theoretical and experimental investigations over decades have provided much information on fundamental processes relevant to H 2 plasmas (see for instance refs 22-27 and references therein), but there is still a dearth of basic data specially on state-resolved cross sections and on gas surface interactions, and many uncertainties remain about the coupling between the plasma chemistry and the discharge dynamics.…”
Section: Introductionmentioning
confidence: 99%
“…Many studies have also been devoted to the atomic hydrogen produced in these plasmas, which is of relevance for film deposition processes. [5][6][7][8] The dynamics of internally excited states of H 2 [9][10][11][12][13][14][15][16][17][18] and its close relationship to the production of H -ions by dissociative electron attachment have been also addressed by various groups. [19][20][21] Theoretical and experimental investigations over decades have provided much information on fundamental processes relevant to H 2 plasmas (see for instance refs 22-27 and references therein), but there is still a dearth of basic data specially on state-resolved cross sections and on gas surface interactions, and many uncertainties remain about the coupling between the plasma chemistry and the discharge dynamics.…”
Section: Introductionmentioning
confidence: 99%
“…doi:10.1016/j.jnucmat.2004. 10.025 low electron energy range of the order of several electron Volt, the incident electrons can attach to the target hydrogen molecules to form negative H À 2 molecules which are mainly in the resonant electronic states of 2 R þ g and 2 R þ g . These H À 2 molecules can either be dissociated or detach the attached electrons to return to H 2 .…”
Section: Modeling Of H 2 Vibrational Distributions In Low Temperaturementioning
confidence: 99%
“…For the process of vibrational exchange, according to [10], the forward v-v reaction rate coefficients in Table 1 can be approximated by:…”
Section: Modeling Of H 2 Vibrational Distributions In Low Temperaturementioning
confidence: 99%
“…Available papers related to the numerical simulation of atomic-molecular composition of plasma in ion sources mainly concern the devices with high gas-discharge current used in fusion reactors, as well as sources of H  ions [1,5]. At the same time many ion sources used in the gas-filled neutron sources operates at relatively low discharge current ( 0.1 2 mA I  ) and the use of the detailed kinetic schemes in the compute-intensive 2D and 3D PIC models for calculation of the plasma chemical composition appears to be difficult.…”
Section: Introductionmentioning
confidence: 99%