1994
DOI: 10.1016/0167-9317(94)90023-x
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Kinetic energy and mass distribution of ablated species formed during pulsed laser deposition

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Cited by 17 publications
(3 citation statements)
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“…A key parameter determining the evaporation rate is the fluence F, i.e. the energy entering the chamber per shot and normalized per unit area of the spot size on the target [40,41,34]. F can be adjusted with both the laser power and a convergent lens located outside the chamber on the beam path.…”
Section: Methodsmentioning
confidence: 99%
“…A key parameter determining the evaporation rate is the fluence F, i.e. the energy entering the chamber per shot and normalized per unit area of the spot size on the target [40,41,34]. F can be adjusted with both the laser power and a convergent lens located outside the chamber on the beam path.…”
Section: Methodsmentioning
confidence: 99%
“…The resistivity of this sample at room temperature was 1.2 mcm which is as low as the reported value ($1 mcm) of bulk samples 8) and epitaxial La 1Àx Sr x MnO 3 (x ¼ 0:3{0:5) thin films grown on SrTiO 3 or LSAT substrates. 12,18) The kinetic energy, 14) composition, 6,15) and spatial distribution 3) of the ablated species could be optimized for growth of high-quality LSMO thin films with atomically flat surfaces and high T C (340 K) by changing the laser ablation conditions. In summary, we have investigated the influence of the ablated spot area on the growth mode, transport and magnetic properties of La 0:6 Sr 0:4 MnO 3 thin films grown by a pulsed laser deposition technique.…”
Section: à4mentioning
confidence: 99%
“…Degradation of thin film crystalline quality and composition nonstoichiometry affect Curie temperature. 5) Laser energy density is related to the kinetic energy 14) and the supply of each species, which influence the growth mode, chemical compositions, 6,15) and crystalline quality of thin films. 6) Change of ablated spot area makes the distribution of chemical species in plume varied, resulting in change of thin film composition.…”
Section: à4mentioning
confidence: 99%