Decreasing Drain-Induced-Barrier-Lowering (DIBL) is one of the nondesirable short-channel effects, causes the threshold voltage of the transistor to be reduced by increasing the drain voltage. DIBL makes it impossible for engineers to consider V T as a constant, and it is necessary to calculate V T as a function of the drain voltage. Therefore, to consider the DIBL effect in the design of ICs, a large computational burden is imposed on the system, which slows down the simulation process in circuit-level simulators. Accordingly, a Nonlinear Feed-Forward Memory-Less (NFFML) model using the Gram-Schmidt orthogonalization approach is proposed, which calculates the V T of the new generation of MOSFETs, that is, Junctionless Double-Gate MOSFETs (JL-DG-MOSFETs), with high precision and a significant speed-up in the computation of the model. It is shown that the proposed numerical method is 313 times faster than the state-of-the-art analytical model. The normalized MSE is 0.435% on average, showing that the proposed approach can be a fast and accurate candidate for replacing the analytical modeling.