Abstract:Diffusion bonding of Ti6Al4V to Al2O3 using Ni/Ti reactive nanomultilayers as interlayer material was investigated. For this purpose, Ni/Ti multilayer thin films with 12, 25, and 60 nm modulation periods (bilayer thickness) were deposited by d.c. magnetron sputtering onto the base materials’ surface. The joints were processed at 750 and 800 °C with a dwell time of 60 min and under a pressure of 5 MPa. Microstructural characterization of the interfaces was conducted by scanning electron microscopy (SEM) with en… Show more
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