“…Since the discovery that soluble high molecular weight polysilanes may be prepared by a Wurtz-Fittig type reductive-coupling of dichloroorganosiianes by alkali metals1,2 shown in Scheme I, there have been a rapidly increasing number of publications reporting their properties. [3][4][5][6] In high-resolution microlithography, polysilanes have potential for application as top-layer imaging resists in multilayer processing6 and as contrast enhancement layers.7 They have been shown to be successful as preceramic materials for the manufacture of Si-C fibers8 and other reinforcement materials.9 They are known photoinitiators of vinyl polymerizations,10 and recently polysilanes have been utilized as photoconductors11 and as nonlinear optical materials. 12 The Wurtz-type preparation of polysilanes often yields only a low fraction of the desirable high molecular weight polymer and a far greater proportion of linear and cyclic oligomers.…”