Penta-twinned metal nanowires are
finding widespread application
in existing and emerging technologies. However, little is known about
their growth mechanisms. We probe the origins of chloride- and alkylamine-mediated,
solution-phase growth of penta-twinned Cu nanowires from first-principles
using multiscale theory. Using quantum density functional theory (DFT)
calculations, we characterize the binding and surface diffusion of
Cu atoms on chlorine-covered Cu(100) and Cu(111) surfaces. We find
stronger binding and slower diffusion of Cu atoms on chlorinated Cu(111)
than on chlorinated Cu(100), which is a reversal of the trend for
bare Cu surfaces. We also probe interfacet diffusion and find that
this proceeds faster from Cu(100) to Cu(111) than the reverse. Using
the DFT rates for hopping between individual sites at Ångstrom
scales, we calculate coarse-grained, interfacet rates for nanowires
of various lengthsup to hundreds of micrometersand
diameters in the 10 nm range. We predict nanowires with aspect ratios
of ∼100, based on surface diffusion alone. We also account
for the influence of a self-assembled alkylamine layer that covers
most of the {100} facets, but is absent or thin and disordered on
the {111} facets and in an “end zone” near the {100}/{111}
boundary. With an end zone, we predict a wide range of nanowire aspect
ratios in the experimental ranges. Our work reveals the mechanisms
by which a halidechloridepromotes the growth of high-aspect-ratio
nanowires.