Recent developments in the study of silyl radicals have been spectacular. Two decades ago, only short‐lived silyl radicals were known and only a few were spectroscopically characterized. Since then, many new types of persistent and stable silyl radicals were synthesized, isolated, and characterized by electron paramagnetic resonance (EPR) spectroscopy, and several also by X‐ray crystallography. These exciting developments are reviewed in this article.
The review consist of five sections: 1. Introduction; 2. Tris(silyl) substituted silyl radicals; 3. Bis(silyl) silicon‐centered radicals X(R
3
Si)
2
Si
·
, where X is a nonsilyl substituent; 4. Anion radicals and metal‐substituted silyl radicals; 5. Conclusions and outlook. The article overviews the methods for the generation and synthesis of silyl radicals, the factors that control their stability and structure, and their EPR parameters. The isolation of stable silyl radicals, anion radicals, and diradicals opens new opportunities for their application as new materials with unique chemical, photophysical, and magnetic properties.