2000
DOI: 10.1103/physrevb.61.14037
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Island nucleation in the presence of step-edge barriers: Theory and applications

Abstract: We develop a theory of nucleation on top of two-dimensional islands bordered by steps with an additional energy barrier ∆ES for descending atoms. The theory is based on the concept of the residence time of an adatom on the island, and yields an expression for the nucleation rate which becomes exact in the limit of strong step edge barriers. This expression differs qualitatively and quantitatively from that obtained using the conventional rate equation approach to nucleation [J. Tersoff et al., Phys. Rev. Lett.… Show more

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Cited by 167 publications
(269 citation statements)
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“…However, vapor condensation and film growth proceed far from thermodynamic equilibrium and thus morphological evolution is primarily determined by the relative rates of competing atomistic structure-forming processes (i.e., by kinetics) [1][2][3]. Currently, the most detailed atomistic * kostas.sarakinos@liu.se description of far-from-equilibrium 3D island formation is based on homoepitaxial systems in which 3D islands (mounds) form by deposition onto existing small islands, followed by atomic-step descent limited by the Ehlrich-Schwöbel barrier [15][16][17][18][19]. However, for weakly interacting film/substrate systems-including Ag/SiO 2 [20][21][22][23][24], Pd/TiO 2 [25], Cu/ZnO [26,27], and Dy/graphene [4,28]-3D islands develop before the initially formed one-atom-high islands are large enough to efficiently capture vapor-phase deposition flux.…”
Section: Introductionmentioning
confidence: 99%
“…However, vapor condensation and film growth proceed far from thermodynamic equilibrium and thus morphological evolution is primarily determined by the relative rates of competing atomistic structure-forming processes (i.e., by kinetics) [1][2][3]. Currently, the most detailed atomistic * kostas.sarakinos@liu.se description of far-from-equilibrium 3D island formation is based on homoepitaxial systems in which 3D islands (mounds) form by deposition onto existing small islands, followed by atomic-step descent limited by the Ehlrich-Schwöbel barrier [15][16][17][18][19]. However, for weakly interacting film/substrate systems-including Ag/SiO 2 [20][21][22][23][24], Pd/TiO 2 [25], Cu/ZnO [26,27], and Dy/graphene [4,28]-3D islands develop before the initially formed one-atom-high islands are large enough to efficiently capture vapor-phase deposition flux.…”
Section: Introductionmentioning
confidence: 99%
“…Even the answer to the simple question as to which of the two grows faster under a given set of conditions is not obvious. The growth of wedding cakes is governed by the rate of two-dimensional nucleation of islands on the top terrace, which is enhanced by the confinement of atoms due to the SEB [21]. In contrast, atoms landing near the top of the spiral mound can avoid the SEB by moving around the core, which should reduce the local adatom concentration and hence the growth rate.…”
mentioning
confidence: 99%
“…4(d) and 4(e). This corresponds to the perimeter of the base terrace, the terrace below the top terrace of a wedding cake, which is known to show less scatter than the top terrace size itself [21]. Using formulas of second layer nucleation theory [14], the base terrace perimeter translates into estimates for E S for the two kinds of mounds, which are displayed in Fig.…”
mentioning
confidence: 99%
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