Iron and nickel thin film deposition via metallocene decomposition

Decoration of Carbon Nanotubes by Semiconducting or Metallic Nanoparticles using Fluidized Bed Chemical Vapour Deposition

“…When compared with the two previous deposition experiments (SnO 2 and Si), the use of ferrocene involves not only a nucleation limitation on the nanotube surface as strong as for the SnCl 4 /H 2 O system, but also a difficulty to form pure iron deposits, which was not the case of the two previous deposits studied. When compared with other works performed on steel, quartz or Si planar substrates (Stauf et al, 1987;Dormans, 1991;Senocq et al, 2006), this difficulty to deposit pure iron is clearly reinforced by the chemical nature of the MWCNT surface. A pre-deposit of TiC as done by Feng and Puddephatt (2007) could improve both the surface reactivity of the MWCNTs and the selectivity of ferrocene decomposition to produce pure iron deposits.…”

“…Among the possible CVD precursors of iron, ferrocene (Fe(C 5 H 5 ) 2 ) is an organometallic compound stable in air and non-toxic, quite cheap and easy to sublimate, forming stable vapour to feed the CVD reactor (Philippe, 2006;Senocq et al, 2006) and able to deposit pure iron (Stauf et al, 1987;Dormans, 1991).…”

Synthesis of Ni nanoparticles with controllable magnetic properties by atmospheric pressure microplasma assisted process

“…This technique combines the advantages of microreactors and the nonthermal plasma chemistry, resulting in a new and facile route for the gas phase fabrication of Ni nanoparticles. Compared to the existing methods (Table 2 [33][34][35][36][37][38][39][40][41][42][43][44][45] ), the present study chooses Ni(cp) 2 as the precursor to replace the commonly used Ni(CO) 4 which is extremely toxic and dangerous. 36 As a consequence, special safety precautions are not needed.…”

Kinetics and Vapor Pressure Studies of bis(<i>N</i>-alkyl-2-hydroxonapthaldimine)nickel (II) (<i>N</i>-R = methyl to pentyl) Complexes

“…Therefore, development of stable, non-toxic and completely volatile solid metallo-organic precursors for use in CVD of metallic nickel has attracted intensive research [1]- [7]. Many publications warned the use of highly toxic Ni(CO) 4 as a precursor [8] [9], which was first used by Mond in 1885.…”

“…Many publications warned the use of highly toxic Ni(CO) 4 as a precursor [8] [9], which was first used by Mond in 1885. Other precursors used in MOCVD of Ni films are Ni(acac) 2 en [1], Ni(tfacim) 2 (tfacim = triflouroacetylacetone-imine) [3] [4], Ni(L) 2 [L= dimethylglyoxime [10], diethylglyoxime, dipropylglyoxime [6]], Ni(η 5 -C 5 H 5 ) 2 [7], Ni(L) 2 [L = acetylacetone (acac) [11], hexafluoroacetylacetone (hfac) [12] and tetramethylheptanedione (tmhd) [13]]. Ni(tmhd) 2 [14] and Ni[(acac) 2 en] [1] met the requirements of an ideal precursors in CVD applications.…”