Ionization of polarized [sup 3]He[sup +] ions in EBIS trap with slanted electrostatic mirror

Pikin, A.; Zelenski, A.; Kponou, A.; Alessi, J.; Beebe, E.; Prelec, K.; Raparia, D.

doi:10.1063/1.2888093

Cited by 2 publications

(15 citation statements)

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“…The polarized 3 He ion source for the EIC will be based on the existing Electron Beam Ion Source (EBIS) at BNL [11,12,13,14], which currently provides high charge state ions to RHIC and will remain the primary source of charged ions from D to U for an EIC based on RHIC (eRHIC). At one end of the EBIS, an electron beam is produced and then radially compressed by a 5 T solenoidal magnetic field before being dumped into an electron collector at the other end.…”

Section: Ebis and 3 He Source Overviewmentioning

confidence: 99%

Polarized 3He++ Ion Source for RHIC and an EIC

Musgrave¹,

Milner²,

Атоян³

et al. 2018

Proceedings of XVII International Workshop on Polarized Sources, Targets &Amp; Polarimetry — PoS(PSTP2017)

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The capability of accelerating a polarized 3 He ion beam in RHIC would demonstrate an effective polarized neutron beam for the study of new high-energy QCD studies of nucleon structure. This development would be particularly beneficial for the future plans of an Electron Ion Collider (EIC), which could use a polarized 3 He ion beam to probe the spin structure of the neutron. The proposed polarized 3 He ion source is based on the Electron Beam Ion Source (EBIS) currently in operation at Brookhaven National Laboratory (BNL). 3 He gas would be polarized within the 5 T field of the EBIS solenoid via Metastability Exchange Optical Pumping (MEOP) and then pulsed into the EBIS vacuum and drift tube system where the 3 He will be ionized by the 10 Amp electron beam. The goal of the polarized 3 He ion source is to achieve 2.5 × 10 11 3 He ++ /pulse at 70% polarization. An upgrade of the EBIS is currently underway at BNL. The EBIS capability to produce polarized 3 He ++ is being developed through a collaboration between BNL and MIT.

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Section: Ebis and 3 He Source Overviewmentioning

confidence: 99%

Polarized 3He++ Ion Source for RHIC and an EIC

Musgrave¹,

Milner²,

Атоян³

et al. 2018

Proceedings of XVII International Workshop on Polarized Sources, Targets &Amp; Polarimetry — PoS(PSTP2017)

Self Cite

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“…A concept for a polarized 3 He ion source based on the existing Electron Beam Ion Source (EBIS) at Brookhaven National Laboratory (BNL) [1][2][3][4] was discussed in these Proceedings [5]. For the beam energies 5-6 MeV, there is a unique opportunity for precise measurements of the absolute 3 He polarization since the analyzing power can be close to 100% for some scattering angles [8].…”

Section: Introductionmentioning

confidence: 99%

“…We propose to make precision measurements of the absolute 3 He ++ polarization at beam energies 5.0-6.0 MeV after the EBIS LINAC. The analyzing power AN for the elastic scattering of polarized 3 He with unpolarized 4 He target with selected kinematic angles is expected to reach the value 100% in this energy range. The main effort of this work is the development of the precision absolute polarimeter for the measurements of the 3 He ++ beam polarization produced in the EBIS as a reference for the further polarization measurements along the accelerator chain.…”

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confidence: 98%

“…The 3 He ++ ion beam will enter the scattering chamber through the thin window to minimize beam energy losses. The scattering chamber is filled with 4 He gas at about 5 torr pressure. The silicon strip detectors will be used for energy and TOF measurements of the scattered 3 He and recoil 4 He nuclei (in coincidence) for the identification of the scattering kinematics.…”

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confidence: 99%

“…The scattering chamber is filled with 4 He gas at about 5 torr pressure. The silicon strip detectors will be used for energy and TOF measurements of the scattered 3 He and recoil 4 He nuclei (in coincidence) for the identification of the scattering kinematics. The status of the polarimeter development: vacuum system, scattering chamber, thin window, Si-strip detectors with end-off electronics and WFD-based DAQ will be presented.…”

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confidence: 99%

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