1999
DOI: 10.1116/1.581912
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Ionization gauge errors at low pressures

Abstract: Factors affecting the accuracy of ionization gauge measurements at low pressures are reviewed. In hot-cathode gauges these include electron-stimulated desorption at the electron collector, forward and reverse x-ray effects, the potential of the gauge envelope, outgassing, and various controller-related errors. In cold-cathode gauges they include nonlinearities below the “magnetron knee,” plasma instabilities, and background currents. Case studies are given to illustrate many of these sources of error and their… Show more

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Cited by 21 publications
(6 citation statements)
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“…For lithium λ ∆ = 0.015 fs nm, which may be compared to λ ∆ = 42 fs nm for caesium. Fermionic isotope 6 Li is particularly attractive due to easy suppression of losses related to intrap collisions. Atoms in hyperfine level 2S 1/2 (F = 1/2), unlike in 2S 1/2 (F = 3/2), do not undergo inelastic binary collisions because this level is the lowest.…”
Section: Choice Of Trapped Atommentioning
confidence: 99%
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“…For lithium λ ∆ = 0.015 fs nm, which may be compared to λ ∆ = 42 fs nm for caesium. Fermionic isotope 6 Li is particularly attractive due to easy suppression of losses related to intrap collisions. Atoms in hyperfine level 2S 1/2 (F = 1/2), unlike in 2S 1/2 (F = 3/2), do not undergo inelastic binary collisions because this level is the lowest.…”
Section: Choice Of Trapped Atommentioning
confidence: 99%
“…At temperatures / U k 0 B , the flux into untrapped momentum sates has additional exponential suppression. Therefore, in 6 Li gas, the evaporative losses can be nulled even without polar izing fermions into a single magnetic state.…”
Section: Choice Of Trapped Atommentioning
confidence: 99%
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“…For example, the dose of X-ray in a portable X-ray tube should be modified by cathode temperature variation to meet the tolerance/requirement of different applications (i.e., imaging or sterilization) without changing the voltage. 10 For ionization vacuum gauges, 11 high emission current is required for sufficient signal intensity, while low electron energy is expected to reduce the X-ray-induced residual photocurrent and the electron-stimulated desorption effect. In low energy electron beam lithography, ideally, it is desired to attain high exposure efficiency by increasing the amount of injection electrons per unit time.…”
Section: Introductionmentioning
confidence: 99%