Ionisation energies of CH2F2 calculated by the SCF Xα technique

Barber, M.; Clark, J.D.; Hinchliffe, Alan; Mann, Stéphane

doi:10.1016/0009-2614(76)80720-8

Cited by 7 publications

(1 citation statement)

References 6 publications

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“…12) The dissociative properties of these gases in the plasma should be fully recognized not only empirically but also mechanistically. Previously, the dissociative properties accompanied with electron attachment, ionization, and electron excitation for the selected fluorocarbon molecules were reported by Lifshitz and Long, 13) Barber et al, 14) Motlagh and Moore, 15) Torres and coworkers, [16][17][18] Seccombe and coworkers, 19) and Christophorou and Olthoff. 20) Moreover, scattering and dissociative charge transfer for the CH 2 F 2 were also reported.…”

Section: Introductionmentioning

confidence: 87%

Dissociative properties of 1,1,1,2-tetrafluoroethane obtained by computational chemistry

Hayashi¹,

Ishikawa²,

Sekine³

et al. 2018

Jpn. J. Appl. Phys.

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The electronic properties and dissociative channels of the alternative to the CCl 2 F 2 (CFC-12) refrigerant, 1,1,1,2-tetrafluoroethane (HFC-134a) with a low global warming potential (GWP, 1430), were revealed by computational chemistry. The results show that CF 3 + and CHF 2 + ions are mainly produced by ionization. The CF 3 CH 2 + ion is produced by ion pair formation and by direct ionization in the energy region higher than approximately 15 eV, but also in small amounts by the ionization of the dissociated CF 3 CH 2 radical. This information is useful for etching process engineers in leading-edge semiconductor manufacturing.

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