Ionic solution-processable Ag nanostructures with tunable optical and electrical properties and strong adhesion to general substrates

Solution-Processable Ag-Mediated ZnO Nanowires for Scalable Low-Temperature Fabrication of Flexible Devices

“…To this end, the solution-processable Ag nanostructure (SPAN) which can be fabricated in a vacuum-free and scalable fashion through the simple coating and much milder annealing (i.e., at ∼120–180 °C) of an ionic Ag ink , can provide a suitable framework for ZNWs. More remarkably, the SPAN film could replace the textured ZnO seed for reliable hydrothermal ZNW growth, as preliminarily noted in earlier studies. , The present work will shed light on how ZNW growth is controlled by the SPAN morphology, which can be readily tuned by the ionic Ag ink concentration and coating condition.…”

“…As an effective and transparent sensing circuit, 25%–1000 rpm SPAN layers of ∼50 nm thickness were initially engineered into micromesh patterns through photolithography followed by wet etching. The optical transmittance and electrical conductivity of the SPAN micromesh structure can be controlled by varying its unit cell size ( S ) and line width ( L ) (see the inset of Figure c), as previously studied in detail . Here, we designed two types of SPAN micromeshes with the S / L values of 500/50 μm and 250/50 μm (simply termed the “500/50 and 250/50 micromeshes” below) onto which ∼4 μm long ZNWs were selectively grown at 90 °C for 15 h to complete the SPAZN structures.…”

“…The optical transmittance and electrical conductivity of the SPAN micromesh structure can be controlled by varying its unit cell size (S) and line width (L) (see the inset of Figure 5c), as previously studied in detail. 19 Here, we designed two types of SPAN micromeshes with the S/L values of 500/50 μm and 250/50 μm (simply termed the "500/50 and 250/50 micromeshes" below) onto which ∼4 μm long ZNWs were selectively grown at 90 °C for 15 h to complete the SPAZN structures. Figure 5a exhibits the exemplary procedure for the fabrication of transparent and flexible SPAZN devices beginning with the 500/50 and/or Figure 5c shows the measured optical transmittances of the 500/50 and/or 250/50 micromesh-patterned SPAZN structures formed on various transparent substrates.…”

Demonstration of a roll-to-roll-configurable, all-solution-based progressive assembly of flexible transducer devices consisting of functional nanowires on micropatterned electrodes

“…As part of the concept of ROLSPAN, a exible lm can be conveyed in a progressive assembly line using support rolls over solution baths and bearing-supported, dumbbell-like rolls (to protect the fabricated structure from direct contact with the roll) in the solutions. While the methods to control the thickness, morphology, and properties of the ionic solution-processable Ag nanostructure (SPAN) have been previously studied in detail [21], the SPAN lm used in this study (Fig. 1b) has typical thickness and sheet resistance values of ~ 50-55 nm and ~ 4-5 Ω/□, respectively, suitable for the ROLSPAN process.…”

“…To this end, we demonstrate a functional micro/nanoarchitecture consisting of solution-processed ZnO nanowire (NW) structures selectively grown on solution-processed Ag electrodes fabricated by continuous rollable photolithography for exible transducer devices such as UV sensors. More speci cally, initially we create Ag layers from the mild thermal reduction of an ionic Ag ink coating, which can be performed on any common -either rigid or exible -substrate, including glass and polymer lm [20][21][22][23]. The Ag layer can then be patterned into interdigitated (IDT) microelectrodes through continuous photo roll lithography (PRL) [24][25][26]; during the PRL process, a exible photomask-attached hollow quartz roll inside of which a UV exposure source is mounted rolls over the photoresist (PR)-coated substrate fed continuously underneath.…”