Ion irradiation of polymers

Calcagno, L.; Fóti, G.

doi:10.1016/0168-583x(91)95784-b

Cited by 109 publications

(42 citation statements)

References 21 publications

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“…It is most likely this process of diffusing radicals for which damage accumulation in SIMS depth profiling is based (region II). An example of this is shown in Figure 15, which shows the solubility of PS plotted as a function of increasing fluence of both He þ and H þ ions (Calcagno & Foti, 1991;Calcagno, 1995). It is assumed that the corresponding SIMS spectra will have a similar drop in signal intensity at this point as it is well-known that increased crosslinking is correlated to decreased secondary ion yields in SIMS (Chilkoti et al, 1993).…”

Section: B Atomic Ion Bombardment Of Polymersmentioning

confidence: 97%

Cluster secondary ion mass spectrometry of polymers and related materials

Mahoney

2009

Mass Spectrometry Reviews

283

329

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Cluster secondary ion mass spectrometry (cluster SIMS) has played a critical role in the characterization of polymeric materials over the last decade, allowing for the ability to obtain spatially resolved surface and in-depth molecular information from many polymer systems. With the advent of new molecular sources such as C(60)(+), Au(3)(+), SF(5)(+), and Bi(3)(+), there are considerable increases in secondary ion signal as compared to more conventional atomic beams (Ar(+), Cs(+), or Ga(+)). In addition, compositional depth profiling in organic and polymeric systems is now feasible, without the rapid signal decay that is typically observed under atomic bombardment. The premise behind the success of cluster SIMS is that compared to atomic beams, polyatomic beams tend to cause surface-localized damage with rapid sputter removal rates, resulting in a system at equilibrium, where the damage created is rapidly removed before it can accumulate. Though this may be partly true, there are actually much more complex chemistries occurring under polyatomic bombardment of organic and polymeric materials, which need to be considered and discussed to better understand and define the important parameters for successful depth profiling. The following presents a review of the current literature on polymer analysis using cluster beams. This review will focus on the surface and in-depth characterization of polymer samples with cluster sources, but will also discuss the characterization of other relevant organic materials, and basic polymer radiation chemistry.

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Section: B Atomic Ion Bombardment Of Polymersmentioning

confidence: 97%

Cluster secondary ion mass spectrometry of polymers and related materials

Mahoney

2009

Mass Spectrometry Reviews

283

329

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“…Moreover, the formation of the hydrogenated amorphous carbon layer in Ar ion implanted polystyrene was also proposed by Calcagno and Foti. 18 The ratio of I D /I G (0.79) ( Table III) represents formation of the graphite-like structure on top of the surface. Figure 5 shows optical absorbance on the basis of Tau'c theory 11 and a measured spectrum of PC with varying fluences from 1.0 × 10 15 to 1.0 × 10 16 ion/cm 2 .…”

Section: Raman Spectroscopymentioning

confidence: 99%

Physically and chemically modified polycarbonate by metal ion implantation

et al. 2008

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“…In this case, the change in I crit is associated with both the increased mass of the He projectile relative to H and the decreased beam energy. 64 Calcagno and Foti show that it is the energy deposited per unit volume, or the local energy density, that is the most important factor in defining I crit . The chemical yield of cross-links in PS, for example, increases with the local energy density.…”

Section: Ion Beam Irradiation and The Gel Pointmentioning

confidence: 99%