Ion implantation into concave polymer surface

Sakudo, N.; Shinohara, T.; Diaz, Amaya, Susana; Endo, H.; Okuji, S.; Ikenaga, Noriaki

doi:10.1016/j.nimb.2005.08.082

Cited by 12 publications

(9 citation statements)

References 3 publications

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“…The application of protective coatings, including hydrogenated amorphous carbon (a-C:H) and diamond-like carbon (DLC) coatings, on the inner surface of dielectric (glass or polymer) vessels is widely used to improve the gas barrier properties and chemical resistance of their walls [1,2]. A common technique for fabricating such coatings is the irradiation of the inner surface of the vessel by energetic ions from the plasma generated by a capacitive or inductive RF discharge ignited inside the vessel in hydrocarbon (methane, propane, acetylene) [2] or nitrogen gas [3]; in the latter case, the protective film is formed from the vessel's surface material. However plasma generation in this way is complicated by the need to match the plasma and generator impedances and by the inefficient transfer of energy into the plasma.…”

Section: Introductionmentioning

confidence: 99%

Beam-plasma discharge in a dielectric cavity by electron beam injection

Zolotukhin

Ломаев

Окс

et al. 2019

Plasma Sources Sci. Technol.

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We have explored the beam-plasma discharge excited by the injection of a continuous electron beam with energy 1-10 keV and current 10-60 mA into a cylindrical dielectric cavity at a pressure of 1-10 Pa. The plasma density and the electron temperature of the discharge are 1.2-3 times greater than for the plasma formed by electron beam transport in the vacuum chamber without a cavity. We describe a model in which there is an additional inflow of energy into the discharge from secondary electrons emitted from the cavity surface by beam electrons and from plasma ions accelerated in the near-wall sheath. We show that this discharge can be used for efficient ion etching of the inner surface of dielectric vessels.

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Section: Introductionmentioning

confidence: 99%

Beam-plasma discharge in a dielectric cavity by electron beam injection

Zolotukhin

Ломаев

Окс

et al. 2019

Plasma Sources Sci. Technol.

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“…Within the dielectric, as no real charge exists, the potential can be solved by Laplace's equation [16] …”

Section: Modelmentioning

confidence: 99%

“…It has also been determined that the normalized auxiliary radius should range from 0.1 to 0.3 if impact energy is desired [14]. But a very few theoretical works have been reported about PIII into cylindrical dielectric film, especially about PET substrates [16].…”

Section: Introductionmentioning

confidence: 99%

Numerical simulation of plasma immersion ion implantation on the inner surface of a cylindrical dielectric target

Wang

2013

Surface and Coatings Technology

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“…A good understanding of sheath dynamics related to PIII is very important. Different numerical and analytical models (Qi et al 2000;Kellerman et al 2002;Masamune and Yukimura 2003;Rauschenbach and Mändl 2003;Miyagawa et al, 2004Miyagawa et al, , 2007Suraj and Mukherjee 2005;Tian et al 2005Tian et al , 2009Sakudo et al 2006;Pillaca et al 2012) have been investigated to describe the sheath physics of PIII. A basic assumption underlying fluid models of PIII is the sheath expanding quasistatically in accordance with the Child current law.…”

Section: Introductionmentioning

confidence: 99%

FDTD study of the effects of the doubly ionized ions on the plasma immersion ion implantation process

Sharifian

Sadeghi

2014

J. Plasma Phys.

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The plasma sheath dynamics adjacent to the cathode in the presence of electrons, ions, and doubly ionized ions have been simulated in this work. The aim of the present investigation is, therefore, to study the effect of the doubly ionized ions on the characteristics of the plasma sheath dynamics such as potential distribution, sheath length, and ions dose and velocity near the surface (cathode). It was shown that the presence of the doubly ionized ions can increase the normalized potential of all positions in sheath region, sheath length, and ion/doubly ionized ions density ratio on the target. Obtained results may be helpful for analyzing the practical results of the surface operations such as ion implantation and plasma polymerization, etc. IntroductionPlasma immersion ion implantation (PIII) is a burgeoning (Conrad 1987;Chen et al. 1991;Collins et al. 1994;Anders 2000) and cost-efficient (Gong et al. 2005) technology for surface modification of materials. With this technique, the range of the targets that can be modified by PIII was enlarged (Qi et al. 2003a). In the PIII process, a target is immersed in plasma and biased negatively to attract ions. A plasma sheath (non-neutral region) is formed around the target that expands into the plasma. The ions inside the sheath region are then accelerated and implanted onto the target surface. As the sheath conformably surrounds the target, all surfaces are implanted at the same time, leading to significantly reduced implantation times (Anders 1997). There is growing worldwide interest in PIII technique due to its versatility in surface treatment of wide range of materials, including metals, semiconductors, ceramics, and polymers (Gong et al. 2005).Study on PIII process is very important for many relevant applications such as to modify the surface properties of materials (Tian et al. 2001(Tian et al. , 2004. Surface modification by ion implantation for wear, corrosion, or electronic device applications is aided by knowledge of the retained dose of the implant species. Together with chemical phase information, the retained dose can serve as a basis for understanding the resulting changes in materials properties and, thereby, provide a method for optimizing the implantation process. PIII process parameters, such as pulse voltage, plasma density, and ions velocity are the crucial factors that will influence the retained dose, and the study of the relation between which will help to tailor the treatment conditions and to get desired results (Qi et al. 2003b).

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Ion implantation into concave polymer surface

Cited by 12 publications

References 3 publications

Beam-plasma discharge in a dielectric cavity by electron beam injection

Beam-plasma discharge in a dielectric cavity by electron beam injection

Numerical simulation of plasma immersion ion implantation on the inner surface of a cylindrical dielectric target

FDTD study of the effects of the doubly ionized ions on the plasma immersion ion implantation process

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