Ion formation in an argon and argon-oxygen gas mixture of a magnetron sputtering discharge

Abstract

Formation of singly and doubly charged Ar q+ and Ti q+ (q=1,2) and of molecular Ar 2 + , ArTi + , and Ti 2 + ions in a direct current magnetron sputtering discharge with a Ti cathode and argon as working gas was investigated with the help of energy-resolved mass spectrometry. Measured ion energy distributions consist of low-energy and high-energy components resembling different formation processes. Intensities of Ar 2 + and ArTi + dimer ions strongly increase with increasing gas pressure. Addition of oxygen gas leads to the formation of positively charged O + , O 2 + , and TiO + and of negatively charged O − and O 2 ions. ExperimentThe experimental set-up has been described in detail before [20][21][22]. The experiment is performed in a vacuum chamber which is pumped to a base pressure of less than 10 −5 Pa. Argon (purity 99.999%) and oxygen gas OPEN ACCESS RECEIVED

XPS and FTIR Studies of DC Reactive Magnetron Sputtered TiO2 Thin Films on Natural Based-Cellulose Fibers

“…It can be observed that the thickness of the films for the same sputtering power does not depend strongly on % O2, although a decreasing trend is revealed. Usually, more O2 in the gas mixture might reduce significantly the Rd because of the shielding effect (promoted by the oxidation of the target surface) that decrease the sputtering rate [24]. However, in this study the increase in O2 from 50% to 75% does not seem to significantly affect the thickness of the films.…”

Time-resolved optical emission spectroscopy of a unipolar and a bipolar pulsed magnetron sputtering discharge in an argon/oxygen gas mixture with a cobalt target

“…The energy-integrated intensity of Co + is about 40×larger compared to Ar + (figure 7). We want to point out that the measured Ar + ion intensities are rather small in comparison to previous measurements [32,41]. There are at least two reasons, in particular, the smaller ionisation probability of Ar compared to Co due to a larger ionisation energy (15.76 eV compared to 7.88 eV, respectively [42]).…”

A positively biased external anode for energy control of plasma ions: hollow cathode and magnetron sputtering discharge

“…Corresponding numbers for the Ti 2+ /Ti + ratio are 5 × 10 −3 and 3 × 10 −4 for the HC and DCMS discharge, respectively. The numbers are rather common for a standard DCMS discharge [60]. We would like to emphasize that the provided numbers are not corrected for the ion detection efficiency which may depend on the particular ion species and thus have to be taken with some caution.…”