Ion flux from the cathode region of a vacuum arc

Kutzner, J.; Miller, H. Craig

doi:10.1109/27.41183

Cited by 132 publications

(47 citation statements)

References 16 publications

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“…[89,104]. The associated power density can be obtained by considering the voltage drop in this region, which is of order 10 V [105,106], hence the power density is also variable up to 10 13 W/m 2 . This is comparable with power densities used in laser plasma ablation, and it should not be surprising that pulsed laser ablation plasmas can be similar to cathodic arc plasmas [107].…”

Section: Cathodic Arc Plasma Production With Emphasis On Pulsed Arcsmentioning

confidence: 99%

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A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Anders

2014

Surface and Coatings Technology

231

109

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High power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.

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Section: Cathodic Arc Plasma Production With Emphasis On Pulsed Arcsmentioning

confidence: 99%

“…Typically 12-28 V for currents less than 1 kA, depending on cathode material [105,106,262]. Such low voltage is the best "fingerprint" to distinguish arcs from magnetron discharges.…”

Section: Property (Pulsed Filtered) Cathodic Arcs Hipimsmentioning

confidence: 99%

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Anders

2014

Surface and Coatings Technology

231

109

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“…The exposure time of the detector was ∼1 s, and the reproducibility was good, with statistical dispersion below 15%, evaluated after 15 registers obtained under identical conditions of the discharge. As can be seen, several lines of Ti-I and Ti-II are registered, but none of Ti-III (within the whole studied spectral range) in spite of being this species the most abundant in Ti cathode arcs (Ti ions are emitted from the cathode spot with charge state of z = +1, +2, +3 and percentages of 27%, 67% and 6%, respectively [6]). Figure 3 shows a typical spectral diagram from window A for Ar at (5.0 ± 0.5)×10 −2 mbar.…”

Section: Resultsmentioning

confidence: 99%

“…Since the ejection velocities of the ions at the spot are ∼ 10 6 cm/s [6], and taking into account the above quoted emission probability, the resulting mean free path for spontaneous radiative decay is ∼ 10 −2 cm. Hence, it can be concluded that the generation of a given excited state population is a local phenomenon which has no memory of the original ion state at the spot.…”

Section: Discussion and Final Remarksmentioning

confidence: 99%

Spectroscopic measurements in a titanium vacuum arc with different ambient gases

Grondona¹,

Kelly²,

Pelloni³

et al. 2004

Braz. J. Phys.

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Spectral emission lines from a low pressure d-c arc discharge with a Ti cathode were studied in various ambient gases; N2, O2, and Ar. Light from the plasma was detected by an optical spectrometer multichannel analyzer (OSMA). The spectral intensities of Ti, Ti + , Ar and N 2 were measured as a function of the gas pressure in the range 5 × 10 −3 − 0.5 mbar. The measurements were performed in the inter-electrode region at different distances from the cathode. For N2 and O2 as the filling gases, the intensities of Ti and Ti + increase with the gas pressure up to pressure values of the order of 0.2−0.4 mbar, while they decrease for higher pressure values. With Ar gas, a different behavior of the Ti + intensity was found; it presents an increasing general trend. The behavior of the lines was qualitatively analyzed in terms of the most relevant atomic processes that take place in the metallic plasma -gas structure (charge-exchange, electron impact excitation and ionization, etc.). It is found that the behavior of the observed spectral lines can be satisfactorily explained in terms of the relevance of these processes as functions of the neutral gas density and electron temperature.

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“…1 In these devices, an intense metallic plasma jet is generated from minute regions on the cathode surface ͑cathode spots͒, with ion kinetic energies in the range of 20-120 eV, depending on the cathode material and on the charge state of the ions. 2,3 In many situations, CVA complex coatings are obtained by combining metallic ions with molecules ͑or atoms͒ of a reactive gas introduced in the discharge chamber. 4 Also, a nonreactive gas such as argon has been introduced to produce a pretreatment of the substrate surface that improves film adhesion 5 or because of the well-known arc-stabilizing effects of Ar.…”

Section: Introductionmentioning

confidence: 99%

Hydrodynamic model for a vacuum arc operated with background gas: Theory and experimental validation

Grondona

Kelly

Minotti

2006

Journal of Applied Physics

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Differences in the metallic plasma-neutral gas structure in a vacuum arc operated with nitrogen and argon J. Appl. Phys. 96, 3077 (2004) A stationary, one-dimensional fluid model is presented to describe the interelectrode region of a nonfiltered vacuum arc operated with a background gas. The model includes the electron energy equation and the main elastic and inelastic atomic processes among metallic ions, electrons, and gas particles. To validate the model predictions an experimental study of the plasma-neutral gas structure, using a titanium ͑Ti͒ cathode and argon ͑Ar͒ as the background gas, is presented. The measured electron temperature and the experimental dependence on the pressure of neutral Ti and Ar spectroscopic emission lines are well reproduced, using a simple atomic model to interpret the plasma radiation emission.

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Ion flux from the cathode region of a vacuum arc

Cited by 132 publications

References 16 publications

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)

Spectroscopic measurements in a titanium vacuum arc with different ambient gases

Hydrodynamic model for a vacuum arc operated with background gas: Theory and experimental validation

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