Ion Exchange in Glass – The Changes of Glass Refraction

Rogoziński, R.

doi:10.5772/51427

Cited by 20 publications

(41 citation statements)

References 62 publications

(98 reference statements)

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“…(4) transformed into the refractive index profile (5) is fitted to the points of the profile reconstructed in the second stage. The parameters D 0A , D 0B , A and B giving the best fit are taken as parameters determining the diffusion coefficients for a given temperature [81]. Carrying out this procedure for different temperatures of diffusion processes the D * 0i and ∆Q i values can be determined based on the Arrhenius Eq.…”

Section: Ion Exchange In Glass As a Technological Methodsmentioning

confidence: 99%

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Producibility of the ion-exchange method in manufacturing gradient refractive index in glass

Rogoziński¹

2014

Bulletin of the Polish Academy of Sciences Technical Sciences

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Abstract. This paper presents the technological aspect of application of the ion exchange method in producing gradient refractive index in glass. The possibility of predictable and repeatable producing of the changes in glass refraction with the use of this method has been presented, as well as the method of in situ control of the process of diffusion doping of glass based on the measurement of the temperature. This method is based on simultaneous (to the carried process) solving the nonlinear diffusion equation modeling the spatio-temporal changes in normalized concentration of the admixture ions in glass. For this purpose the knowledge of temperature characteristics of diffusion coefficients of exchanged ions is used. The result of such control of diffusion processes is information on the current (temporary) refractive index profile of the resulting waveguide. The presented method of control has been confirmed by experimental results, which concern modeling and measurements of planar waveguide structures of slab type. The proposed methodology can also be used to control the diffusion processes of producing another type of two-and three-dimensional gradient structures. According to the author's knowledge the method mentioned above has not been described in literature before.

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Section: Ion Exchange In Glass As a Technological Methodsmentioning

confidence: 99%

“…Theoretical description of changes in refractive index of glass is based on a mathematical model of a two-component ion exchange [80,81]. It assumes the existence of only two types of ions involved in the exchange process.…”

Section: Ion Exchange In Glass As a Technological Methodsmentioning

confidence: 99%

Producibility of the ion-exchange method in manufacturing gradient refractive index in glass

Rogoziński¹

2014

Bulletin of the Polish Academy of Sciences Technical Sciences

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“…Due to the small thickness of masking silica layers it can be used to stimulate potential waveguide modes under a masking layer. The effective refractive indices determined in this way have uncertainties of ~10 -4 [8]. All measurements were carried out for the wavelength λ=677nm and TE polarization.…”

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confidence: 99%

“…However, in the area of glass coated with a masking silica layer, as a result of its partial permeability, a shallower waveguide area can also be expected to be produced. To study the waveguide properties of these two areas of glass a waveguide method was used based on the goniometric measurements of the synchronous angles of waveguide modes [8]. In this method, the measuring element is a prism coupler.…”

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confidence: 99%

“…The ion exchange processes were simulated based on the mathematical model of a two-component ion exchange phenomenon. The dependence of diffusion coefficients of exchanged ions on their normalized concentrations in the glass area was assumed [8]. In the case of multimode waveguides formed in the unmasked areas of glass, the refractive index profiles were reconstructed based on effective indices of the modes on the basis of WhiteHeidrich waveguide method [9].…”

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Silica layers produced by the sol-gel method as dielectric masks in ion exchange processes

Rogoziński

Karasiński²,

Tyszkiewicz³

2012

Photon. Lett. Poland

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Abstract-This paper presents experimental results produced by the sol-gel method silica layers usage as dielectric masks in ion exchange processes in producing stripe waveguides. Such layers were produced on the glass substrate (soda-lime glass) by the dip-coating method. Their thicknesses gained during single deposit on the substrate were in the range of 78÷150nm. Those layers had the compactness comparable to thermal silica. The Ag + ↔Na + ion exchange processes with the use of AgNO3/NaNO3 solution with the mole fraction of κAg=0.0025 were completed. The permeability of the layers for dopant ions (Ag + ) depending on the thickness of the layer and the diffusion time was tested.The production of gradient structures of integrated optics with the use of the ion exchange method often requires the use of selective diffusion processes of an ion dopant into the glass substrate. In this way, gradient stripe waveguides are produced, as well as all kinds of diffractive structures (such as microlenses). The processes of selective diffusion of admixture ions into glass require the use of respective masking layers to ensure the blocking of admixture access to the masked areas of glass. Such layers should be chemically resistant to the environment of a liquid source of admixture (these are usually strong oxidizers operating at high temperatures). They must also display good adhesion to the glass surface and be able to undergo photochemical processing (shaping coverage topology). Generally, masking layers used in the ion exchange processes can be distinguished into metallic and dielectric. Most commonly used [1-4] metallic layers (Al, Ti, Cr) are applied on the glass surface by the vacuum evaporation technique. By using photolithographic processes a corresponding pattern is formed in the applied layer exposing the glass surface at selected locations. There is also a possibility of oxidation of the metallic layer with an etched pattern. This technique is applied in aluminum layers by electrolytic oxidation, providing a dielectric layer of Al 2 O 3 . Other dielectric layers that are applied directly by the vacuum evaporation technique or cathode sputtering are: SiO 2 , Ta 2 O 5 . In this paper, we propose the use of silica as a masking layer. Those layers are produced by the sol-gel method. Depending on the manner of their manufacturing process, they may have a different porosity [5]. For applications of such layers as dielectric masks the preference will be the compact layers comparable to thermal silica. The use of such layers as dielectric masks is also possible due to the possibility of chemical etching [6][7] allowing the formation of masking areas topology in ion exchange processes. The following test results are applicable to determine the degree of permeability of the silica layers by using them as masks for ion-exchange processes. The research included thickness of the layers and duration of the processes.The subject of the research was substrate of soda-lime glass (Menzel Glasser's). Completed technological processes...

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