Ion energy distributions in a pulsed, electron beam-generated plasma

Walton, Scott G.; Leonhardt, D.; Blackwell, David; Fernsler, R. F.; Murphy, D.P.; Meger, R. A.

doi:10.1116/1.1345901

Cited by 22 publications

(4 citation statements)

References 14 publications

(8 reference statements)

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“…Electron beam-generated plasmas (hereafter referred to as ebeam plasmas) have been shown to have characteristics suitable for atomic precision plasma processing [8]. With high ion density, low electron temperature (T e ), and ion energies less than 5.0 eV in plasmas of molecular gases [9,10], ebeam plasmas can deliver a large flux of low-energy ions to adjacent substrates. A significant amount of research has been reported on the characterization of ebeam plasmas [9][10][11][12] as well as materials processing using these plasmas [2,[13][14][15][16].…”

Section: Introductionmentioning

confidence: 99%

“…With high ion density, low electron temperature (T e ), and ion energies less than 5.0 eV in plasmas of molecular gases [9,10], ebeam plasmas can deliver a large flux of low-energy ions to adjacent substrates. A significant amount of research has been reported on the characterization of ebeam plasmas [9][10][11][12] as well as materials processing using these plasmas [2,[13][14][15][16]. Work has also been done on developing industrial-scale ebeam plasma processing systems [17,18].…”

Section: Introductionmentioning

confidence: 99%

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Particle-in-cell modeling of electron beam generated plasma

Rauf

Sydorenko

Jubin

et al. 2023

Plasma Sources Sci. Technol.

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Plasmas generated using energetic electron beams are well known for their low electron temperature (Te) and plasma potential, which makes them attractive for atomic-precision plasma processing applications such as atomic layer etch and deposition. A 2-dimensional particle-in-cell (PIC) model for an electron beam-generated plasma in Argon confined by a constant applied magnetic field is described in this article. Plasma production primarily occurs in the path of the beam electrons in the center of the chamber. The resulting plasma spreads out in the chamber through non-ambipolar diffusion with a short-circuit effect allowing unequal electron and ion fluxes to different regions of the bounding conductive chamber walls. The cross-field transport of the electrons (and thus the steady-state characteristics of the plasma) are strongly impacted by the magnetic field. Te is anisotropic in the electron beam region, but low and isotropic away from the plasma production zone. The plasma density increases, and the plasma becomes more confined near the region of production when the magnetic field strengthens. The magnetic field reduces both electron physical and energy transport perpendicular to the magnetic field. Te is uniform along the magnetic field lines and slowly decreases perpendicular to it. Electrons are less energetic in the sheath regions where the sheath electric field repels and confines the low-energy electrons from the bulk plasma. Even though electron and ion densities are similar in the bulk plasma due to quasi-neutrality, electron and ion fluxes on the grounded chamber walls are unequal at most locations. Electron confinement by the magnetic field weakens with increasing pressure, and the plasma spread out farther from the electron beam region.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Particle-in-cell modeling of electron beam generated plasma

Rauf

Sydorenko

Jubin

et al. 2023

Plasma Sources Sci. Technol.

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“…10.55427.19539 При транспортировке килоэлектронвольтных электронных пучков сквозь газовую атмосферу в диапазоне давлений среднего вакуума 1−100 Pa генерируется плотная пучковая плазма с температурой электронов несколько eV [1], обладающая рядом уникальных параметров и свойств. Высокая эффективность диссоциации молекул и ионизация продуктов их распада в пучковой плазме [2], а также установившийся положительный относительно заземленных стенок вакуумной камеры потенциал плазмы [3] делают такую плазму привлекательной для использования в технологиях ионно-плазменной модификации материалов [4,5].…”

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Механизм Ионизации Пучковой Плазмы, Генерируемой Электронным Пучком В Среднем Вакууме

Тюньков¹,

Андронов²,

Юшков³

et al. 2023

Письма В Журнал Технической Физики

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We present the results of the measurements of the ionic composition of plasma generated by an accelerated electron beam at medium vacuum (fore-vacuum) pressures. Calculations of the contribution of plasma electrons and beam electrons to the mechanism of ionization are presented. Comparison of the calculated with the experimental data led us to the conclusion about the dominating contribution of beam electrons and to the ionization process.

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“…Dense beam plasma with an electron temperature of several electronvolts [1], which features a number of unique parameters and properties, is generated in the process of transport of kiloelectronvolt electron beams in a gas atmosphere within the range of medium vacuum pressures (1−100 Pa). The high efficiency of dissociation of molecules, ionization of their decomposition products in beam plasma [2], and a positive potential of plasma relative to grounded walls of the vacuum chamber [3] make such plasma viable for application in ion-plasma material modification processes [4,5].…”

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confidence: 99%