Ion energy and mass analyzer at radio frequency electrode in a plasma chamber

Mizutani, Naoki; Nagata, Yasuhiko; Kubo, Atsushi; Hayashi, Toshio

doi:10.1063/1.1148865

Cited by 14 publications

(11 citation statements)

References 5 publications

(5 reference statements)

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“…In addition RFEAs have also been used to measure electron energy distribution functions (EEDF) by other groups [4]. To date, RFEA's have been used mainly for IED measurement [5,6,7,8,9], with only limited application to in-situ determination of ion flux density [10] due to the lack of a clear consensus on how best to calibrate its ion current density measurements.…”

Section: Introductionmentioning

confidence: 99%

Retarding field energy analyser ion current calibration and transmission

Denieffe¹,

Mahony²,

Maguire³

et al. 2011

J. Phys. D: Appl. Phys.

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Accurate measurement of ion current density and ion energy distributions (IED) is often critical for plasma processes in both industrial and research settings. Retarding field energy analyzers (RFEA) have been used to measure IEDs because they are considered accurate, relatively simple and cost effective. However, their usage for critical measurement of ion current density is less common due to difficulties in estimating the proportion of incident ion current reaching the current collector through the RFEA retarding grids. In this paper an RFEA has been calibrated to measure ion current density from an ion beam at pressures ranging from 0.5 to 50.0 mTorr. A unique method is presented where the currents generated at each of the retarding grids and the RFEA upper face are measured separately, allowing the reduction in ion current to be monitored and accounted for at each stage of ion transit to the collector. From these I-V measurements a physical model is described. Subsequently, a mathematical description is extracted which includes parameters to account for grid transmissions, upper face secondary electron emission and collisionality. Pressure-dependant calibration factors can be calculated from least mean square best fits of the collector current to the model allowing quantitative measurement of ion current density.

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Section: Introductionmentioning

confidence: 99%

Retarding field energy analyser ion current calibration and transmission

Denieffe¹,

Mahony²,

Maguire³

et al. 2011

J. Phys. D: Appl. Phys.

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“…The plasma was generated by a one turn inductively coupled coil, and the energy of the ions that bombard the rf biased electrode were analyzed through an orifice in the electrode. 13,14 The voltage signals from the current meter in the rf potential were converted into frequency signals, they were then transmitted to the grounded computer through the optical fiber, and finally, the data was acquired using LABVIEW on the computer. The analyzer that was used for the IED and IAD measurements is shown in Fig.…”

Section: Methodsmentioning

confidence: 99%

“…The etching characteristics, that is, the etching rate, the profile, and the selectivity for the different materials depend on the ion energy. 13,14 Such rf floating IEA devices have been developed and used. 1 The energy distributions of ions that bombarded the grounded electrodes in plasma apparatuses, have been measured by many groups during the past 30 years.…”

Section: Introductionmentioning

confidence: 99%

Ion energy and angular distribution at the radio frequency biased electrode in an inductively coupled plasma apparatus

Mizutani

Hayashi

2001

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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“…The energy and mass distributions of the ions and radicals in a plasma depend on various process parameters, and they play an important role in controlling semiconductor processes such as etching, cleaning, and deposition. Thus, it is important to measure and analyze the distribution of the plasma species in a plasma [1][2][3][4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy)

Kim

et al. 2021

Coatings

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We constructed a capacitively coupled plasma (CCP) source and installed various diagnostic tools to perform process diagnosis using a plasma process gas (CxFy). We obtained the energy and mass distributions of the ions and radicals from Ar, C4F8/Ar, and C4F6/Ar plasmas. The energy distribution of the ions incident on the substrate was controlled using the self-bias voltage, and the ion energy was found to be inversely proportional to the mass. The measured species and density of the ions and radicals can help understand plasma process results as they provide information about the ions and radicals incident on the substrate.

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Ion energy and mass analyzer at radio frequency electrode in a plasma chamber

Abstract: Measurement of ion energy distributions using a combined energy and mass analyzer Rev. Sci. Instrum. 78, 083503 (2007); 10.1063/1.2769352Low-cost modification for the high-frequency raster on the Cameca IMS-3F secondary ion mass spectrometer

Cited by 14 publications

References 5 publications

Retarding field energy analyser ion current calibration and transmission

Retarding field energy analyser ion current calibration and transmission

Ion energy and angular distribution at the radio frequency biased electrode in an inductively coupled plasma apparatus

Ion and Radical Characteristics (Mass/Energy Distribution) of a Capacitively Coupled Plasma Source Using Plasma Process Gases (CxFy)

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