Ion beams and their applications in high-resolution probe formation

Guharay, S. K.; Orloff, J.; Wada, M.

doi:10.1109/tps.2005.860086

Cited by 11 publications

(6 citation statements)

References 111 publications

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“…The main disadvantages of this source are the internal cathodic element ͑limiting life and the number of available gas/ion species͒ and the marginal brightness for high current applications. Many other groups have also reported advances in plasma ion source brightness, [5][6][7] anticipating unprecedented small spot sizes from theoretical spot size calculations.…”

Section: ͑6͒mentioning

confidence: 99%

High brightness inductively coupled plasma source for high current focused ion beam applications

Smith¹,

Skoczylas²,

Kellogg³

et al. 2006

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

138

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A high brightness plasma ion source has been developed to address focused ion beam ͑FIB͒ applications not satisfied by the liquid metal ion source ͑LMIS͒ based FIB. The plasma FIB described here is capable of satisfying applications requiring high mill rates ͑Ͼ100 m 3 / s͒ with non-gallium ions and has demonstrated imaging capabilities with sub-100-nm resolution. The virtual source size, angular intensity, mass spectra, and energy spread of the source have been determined with argon and xenon. This magnetically enhanced, inductively coupled plasma source has exhibited a reduced brightness ͑␤ r ͒ of 5.4ϫ 10 3 A m −2 sr −1 V −1 , with a full width half maximum axial energy spread ͑⌬E͒ of 10 eV when operated with argon. With xenon, ␤ r = 9.1 ϫ 10 3 A m −2 sr −1 V −1 and ⌬E = 7 eV. With these source parameters, an optical column with sufficient demagnification is capable of forming a sub-25-nm spot size at 30 keV and 1 pA. The angular intensity of this source is nominally three orders of magnitude greater than a LMIS making the source more amenable to creating high current focused beams, in the regime where spherical aberration dominates the LMIS-FIB. The source has been operated on a two lens ion column and has demonstrated a current density that exceeds that of the LMIS-FIB for current greater than 50 nA. Source lifetime and current stability are excellent with inert and reactive gases. Additionally, it should be possible to improve both the brightness and energy spread of this source, such that the ͑␤ r / ⌬E 2 ͒ figure-of-merit could be within an order of magnitude of a LMIS.

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Section: ͑6͒mentioning

confidence: 99%

High brightness inductively coupled plasma source for high current focused ion beam applications

Smith¹,

Skoczylas²,

Kellogg³

et al. 2006

Journal of Vacuum Science &Amp; Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

138

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“…With argon a maximum reduced brightness of 10 3 A m À2 sr À1 V À1 with DE = 4.5 eV has been achieved [18], while with H À a pulsed (1% duty factor) brightness of 7 Â 10 4 A m À2 sr À1 V À1 and an energy spread of 3 eV were possible, however, the time averaged reduced brightness is still only 700 A m À2 sr À1 V À1 . For O À , Guharay reports a factor of 4 reduction in brightness over H À [19], resulting in a time averaged brightness of only 175 A m À2 sr À1 V À1 . This performance with O À is factor of 3-5 higher than typical Duoplasmatrons and for pulsed applications, the Penning source could be an interesting option.…”

Section: Introductionmentioning

confidence: 99%

A high brightness source for nano-probe secondary ion mass spectrometry

Smith

Tesch

Martin

et al. 2008

Applied Surface Science

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“…The application of focused ion beam (FIB) implantation in many fields of research results in a continuous demand for appropriate ions. These ions can be delivered by liquid metal ion sources (LMIS) and mainly by liquid alloy ion sources (LAIS) for long operating times (Guharay and Orloff 2005). Currently there is increasing interest in the implantation of magnetic ions, e.g.…”

Section: Introductionmentioning

confidence: 99%

“…The difference in m/q (m: mass, q: charge number) between the two peaks amounts to only 0.169. This source works in a stable way down to a minimum source current of 0.5 µA and its Co + peak was successfully used for the implantation of cobalt into silicon for the preparation of cobalt silicide structures (Fuhrmann 2000). For the production of dysprosium and nickel ions Melnikov et al (2002) developed a Dy-Ni LAIS and found Dy ++ as the main component in the beam.…”

Section: Introductionmentioning

confidence: 99%

“…The whole preparation procedure of the emitter was dictated by the aim to produce an ion source, working in a stable way at low source current for an adequate time. For the application of LMIS in focused ion beam systems it is generally necessary to operate the source at the lowest possible current (1-2 µA) to have a low beam diameter and a high current density in the beam (Guharay and Orloff 2005). Therefore our investigations have been limited to a source current up to 15 µA.…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Investigations on a Co–Dy liquid alloy ion source

Mühle¹,

Döbeli²,

Melnikov³

2007

J. Phys. D: Appl. Phys.

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We have investigated the emission characteristics of a Co–Dy liquid alloy ion source intended for focused ion beam implantation of cobalt and dysprosium ions. An alloy composition of Co2Dy was selected in order to have a relatively low melting temperature, sufficient cobalt concentration for ion implantation purposes and low corrosion effects of the alloy and emitter tungsten wires. We have measured the melting behaviour of the alloy, the emission current stability, the current–voltage characteristics and the mass and energy spectra as a function of source current using a time-of-flight spectrometer. The ion source exhibits a good performance even after storage for several weeks in dry air. The mass spectra show a high intensity of doubly charged dysprosium ions and singly and doubly charged cobalt ions. The Co–Dy source works in a stable way for at least several days.

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Ion beams and their applications in high-resolution probe formation

Cited by 11 publications

References 111 publications

High brightness inductively coupled plasma source for high current focused ion beam applications

High brightness inductively coupled plasma source for high current focused ion beam applications

A high brightness source for nano-probe secondary ion mass spectrometry

Investigations on a Co–Dy liquid alloy ion source

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