Ion beam profile monitor

EerNisse, E.P.; Peterson, G. D.; Schueler, D. G.

doi:10.1063/1.1134182

Cited by 8 publications

(1 citation statement)

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“…Respective cups produce a specific signal corresponding to the collected charges due to the incident charged particles. Collected charges signals are amplified and processed by using an electronic beam monitoring system [7][8][9]. In what follows, we describe the mechanical and electrical design of a MAFC to measure the beam current and the two-dimensional current distribution in the ion source.…”

Section: Introductionmentioning

confidence: 99%

Monitoring transverse beam profiles of a Penning ion source using a position-sensitive Multi Array Faraday Cup

Ebrahimibasabi¹,

Feghhi²

2015

J. Inst.

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In this paper, we describe the design and construction of a Multi Array Faraday Cup for both beam profiling and current measurements in a Penning ion source. This diagnostic system includes an array configured from multiple cups electrically isolated from each other to collect charged particles incident on the respective cups. Each cup in the array produces a specific signal corresponding to the collected charges due to the incident charged particles. Collected charges signals are amplified and processed by using an electronic beam monitoring system. A testing setup has been designed for testing and calibration of the system. Experiments have been set up for evaluation of proper functioning of the MAFC in measurement of different beam profiles produced by using the testing set-up. Additionally, total extracted ion current and transverse beam profile has been measured for a Penning ion source.

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Section: Introductionmentioning

confidence: 99%