Ion-Beam Methods for High-Precision Processing of Optical Surfaces

Diamond-carbide-silicon composite "skeleton" as a promising material for X-ray optical substrates

“…The flatness of the surface is also noticeably inferior to the parameters obtained using traditional optical technologies (lapping allows you to obtain a surface with a height difference of PV < 100 nm and a standard deviation of the surface shape from the plane / sphere RMS < 10 nm). Nevertheless, the roughness values at the level of 1 nm allow us to hope that the use of lapping methods with finishing superpolishing developed in the work of [18], and precision correction of shape errors, including ion-beam methods [19], will allow to obtain roughness and flatness at an acceptable level for X-ray optical applications.…”

Imaging system of a plasma torch of a Betatron X-ray source

“…Wavefront errors were corrected by correcting the shape of the " large" concave mirror M1 by ion beam etching. The technique of correcting local shape errors by small-sized and wideaperture ion beams is described in detail in [11]. After three iterations (one axisymmetric by a wide-aperture ion beam and two local by a small-sized ion beam), the wavefront errors of the primary mirror M1 were reduced by more 12.5 13.5 than 6 times to RMS ∼ 2.1 nm.…”