Ion beam, focused ion beam, and plasma discharge machining

Allen, D.M.; Shore, Paul; Evans, R. W.; Fanara, C.; O’Brien, W. L.; Marson, Silvia; O’Neill, W

doi:10.1016/j.cirp.2009.09.007

Cited by 66 publications

(24 citation statements)

References 82 publications

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“…Because the FIB sputtering method has advantages of high resolution, high flexibility, and maskless process, it has been widely used in the versatile applications, such as nano-optics (Gramotnev and Bozhevolnyi 2010), nano-manufacturing (Allen et al 2009), bio-sensing (Lal et al 2007), micro tool with nanoscale cutting edge , etc.…”

Section: Fib Sputtering Applicationsmentioning

confidence: 99%

Focused Ion Beam Nanofabrication Technology

Xu¹,

Zeng²

2013

Handbook of Manufacturing Engineering and Technology

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Focused ion beam has become an increasingly popular tool for the manufacturing of various types of micro-/nanostructures and devices for different applications. In this chapter, the recent developments of the FIB technologies in the micro/nano manufacturing are presented in details. FIB technologies mainly involve four main approaches: imaging, milling, ion-induced deposition, and implantation. The working principle and key techniques underlying the four approaches are introduced with an emphasis on their abilities in micro-/nanofabrications. The application fields involving using the FIB micro-/nanofabrication technologies are also presented, such as micro optical elements, plasmonic lenses, etc. Concluding remarks and outlook of the future research on the FIB technologies in micro/nano manufacturing are provided at the end of the chapter.

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Section: Fib Sputtering Applicationsmentioning

confidence: 99%

Focused Ion Beam Nanofabrication Technology

Xu¹,

Zeng²

2013

Handbook of Manufacturing Engineering and Technology

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“…Focused ion beam (FIB) technology has unique advantages in comparison with other micro/nano-machining technologies such as high resolution, maskless processing, and rapid prototyping [3][4][5]. FIB milling technology has become an important approach in micro/nano-machining for the various applications, such as photomask repair [6], fabrication of photonic crystals with submicron period [7], and configuration optimization of carbon nanotube probes [8].…”

Section: Introductionmentioning

confidence: 99%

Nano-photomask fabrication using focused ion beam direct writing

Fang

et al. 2010

CIRP Annals

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“…The core drilling with diamond tool [4] and various non-traditional methods such as laser beam machining (LBM) [4,5], rotary ultrasonic machining (RUM) [6], electrical discharge machining (EDM) [7,8], electrochemical discharge machining (ECDM) [9], abrasive water jet machining (AWJM) [10] and ion beam machining [11] can be adopted to drill different kinds of holes in ceramics. The weakness of non-traditional methods is the lower material removal rate, the higher energy consumption and cost.…”

Section: Introductionmentioning

confidence: 99%