Ion beam and plasma technology development for surface modification at Los Alamos National Laboratory

Davis, H.A.; Wood, B.P.; Munson, C. P.; Bitteker, Leo; Nastasi, M.; Rej, D. J.; Waganaar, W. J.; Walter, K.C.; Coates, D.M.; Schleinitz, H. M.

doi:10.1016/s0254-0584(98)00102-3

Cited by 29 publications

(3 citation statements)

References 7 publications

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“…Therefore, the cohesion between film and substrate can be reinforced dramatically. Nevertheless, there is scarcely study on enhancing the adhesion between film and substrate by HIPIB [6] .…”

Section: Introductionmentioning

confidence: 99%

Numerical Study on the Two-Dimensional Temperature Fields of Titanium/Aluminum Double-Layer Target Irradiated by High-Intensity Pulsed Ion Beam

Lei

Xiaopeng

et al. 2010

Plasma Sci. Technol.

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Interaction between high-intensity pulsed ion beam (HIPIB) and a double-layer target with titanium film on top of aluminum substrate was simulated. The two-dimensional nonlinear thermal conduction equations, with the deposited energy in the target taken as source term, were derived and solved by finite differential method. As a result, the two-dimensional spatial and temporal evolution profiles of temperature were obtained for a titanium/aluminum double-layer target irradiated by a pulse of HIPIB. The effects of ion beam current density on the phase state of the target materials near the film and substrate interface were analyzed. Both titanium and aluminum were melted near the interface after a shot when the ion beam current density fell in the range of 100 A/cm 2 to 200 A/cm 2 .

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Section: Introductionmentioning

confidence: 99%

Numerical Study on the Two-Dimensional Temperature Fields of Titanium/Aluminum Double-Layer Target Irradiated by High-Intensity Pulsed Ion Beam

Lei

Xiaopeng

et al. 2010

Plasma Sci. Technol.

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“…Superior to the latter, it can implant all surfaces of the target simultaneously without complicated workpiece or beam manipulation [1,2]. Not only can PBII perform the function of ion implantation with high efficiency, but it can also add high energy ion bombardment to other surface modification technique and thus produce layers with excellent properties [3,4]. Being a versatile technique, PBII has been applied to modify the surface properties of a wide range of materials [5][6][7].…”

Section: Introductionmentioning

confidence: 99%

Study on the treatment capability of a plasma-based ion implanting trench-shaped target

Sun¹,

Wu²,

Changxin³

et al. 2005

Modelling Simul. Mater. Sci. Eng.

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The treatment capability of a plasma based ion implanting two-dimensional trench-shaped target has been discussed through particle-in-cell simulation. By analysing time-dependent expansion of the plasma sheath and the ion implantation parameters during a high voltage pulse, we found that the sidewall of the trench could not be implanted effectively. Trenches with the same depth and three different widths were simulated in this paper. Simulation results show that the plasma sheath conforms to the target better in the case of a wider trench, but it tends to expand as a plane for the majority of the pulse. The ions accelerated in such a sheath would impinge vertically on the upper surface and the bottom of the trench with the converging at the convex corner and diverging at the concave corner, but neglecting the sidewall. After the short initial stage of the pulse when the sheath is conformal to the target well (about 1/10 of the pulse duration), the ions impact the sidewall of the trench with grazing angle, lowest ion impact current, and lowest ion impact energy. All the above three factors would induce a severe sputtering effect, reduce ion implantation depth and decrease retained dose. Increasing the width of the trench would alleviate this effect, but to a slight extent. The plasma based ion implantation process in trench cases is similar to ion beam implantation with a large beam and would not get the effective implantation for all the surfaces of the trench.

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“…* Hence PHIBs are expected to be applied to surface treatment [1,2], thin-film deposition [3] or implantation processes. In particular, for implantation processes, PHIBs are expected to be used as a new type of technology since ion implantation and surface heat treatment or surface annealing are completed at one and the same time [4,5].…”

Section: Introductionmentioning

confidence: 99%

Generation of an intense pulsed heavy-ion beam by aB_y-type, magnetically insulated ion diode with an active ion source

Masugata

Tejima

Higashiyama

et al. 2005

Plasma Devices and Operations

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A new type of a pulsed heavy-ion beam diode with a new configuration of the acceleration gap and an active ion source of gas puff plasma gun was developed. With the plasma gun, nitrogen plasma was produced and injected into the acceleration gap of the diode. The ion diode was operated at a diode voltage of about 200 kV, a diode current of about 2.0 kA and a pulse duration of about 150 ns. An ion beam with an ion current density of about 13 A cm −2 was obtained 55 mm downstream from the anode. From measurements with the Thomson parabola spectrometer we found that N + and N 2+ beams of 60-300 keV energy were accelerated with proton impurities of 60-150 keV energy. The purity of the beam was estimated to be 87%. To generate metallic ions, a vacuum arc plasma gun was developed and an aluminium plasma with an ion current density of 8 A cm −2 was obtained.

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Ion beam and plasma technology development for surface modification at Los Alamos National Laboratory

Cited by 29 publications

References 7 publications

Numerical Study on the Two-Dimensional Temperature Fields of Titanium/Aluminum Double-Layer Target Irradiated by High-Intensity Pulsed Ion Beam

Numerical Study on the Two-Dimensional Temperature Fields of Titanium/Aluminum Double-Layer Target Irradiated by High-Intensity Pulsed Ion Beam

Study on the treatment capability of a plasma-based ion implanting trench-shaped target

Generation of an intense pulsed heavy-ion beam by aB_y-type, magnetically insulated ion diode with an active ion source

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Ion beam and plasma technology development for surface modification at Los Alamos National Laboratory

Cited by 29 publications

References 7 publications

Numerical Study on the Two-Dimensional Temperature Fields of Titanium/Aluminum Double-Layer Target Irradiated by High-Intensity Pulsed Ion Beam

Numerical Study on the Two-Dimensional Temperature Fields of Titanium/Aluminum Double-Layer Target Irradiated by High-Intensity Pulsed Ion Beam

Study on the treatment capability of a plasma-based ion implanting trench-shaped target

Generation of an intense pulsed heavy-ion beam by aBy-type, magnetically insulated ion diode with an active ion source

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Product

Resources

About

Generation of an intense pulsed heavy-ion beam by aB_y-type, magnetically insulated ion diode with an active ion source