2011
DOI: 10.1149/1.3633673
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(Invited) Atomic Layer Deposition of Superconductors

Abstract: We report the use of atomic layer deposition (ALD) to synthesize thin superconducting films and multilayer superconductorinsulator (S-I) hetero-structures. ALD applied to superconducting films opens the way for a variety of applications, including improving the performance and decreasing the cost of high energy particle accelerators, superconducting wires for energy storage, and bolometers for radiation detection. Furthermore, the atomicscale thickness control afforded by ALD enables the study of superconducti… Show more

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Cited by 20 publications
(20 citation statements)
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“…From this composition analysis, the origin of the low Tc (< 3 K) before annealing could be correlated with the absence of carbon in our films. This correlates with the results obtained by Proslier et al where the NbN films grown from NbCl 5 (i.e., carbonfree films) also exhibit a Tc value below 3 K[11]. The carbon enhanced the Tc and, based on…”
supporting
confidence: 91%
See 1 more Smart Citation
“…From this composition analysis, the origin of the low Tc (< 3 K) before annealing could be correlated with the absence of carbon in our films. This correlates with the results obtained by Proslier et al where the NbN films grown from NbCl 5 (i.e., carbonfree films) also exhibit a Tc value below 3 K[11]. The carbon enhanced the Tc and, based on…”
supporting
confidence: 91%
“…improved the superconducting critical temperature (Tc) from 4 K to 7.5 K [11]. Nevertheless, the reducing power of the reactive gases like NH 3 used in thermal ALD is insufficient to obtain stoichiometric nitrides from a metal precursor [12].…”
Section: Introductionmentioning
confidence: 99%
“…This highly controllable process provides superior thickness and stoichiometric uniformity and an atomically smooth surface 18,19 as compared to chemical vapor deposition, the standard technique used to grow NbTiN films 20 . We used NbCl 5 , TiCl 4 , and NH 3 as gaseous reactants; the stoichiometry was tuned by varying the ratio of TiCl 4 /NbCl 5 cycles during growth 21 . The superconducting properties of these ultrathin NbTiN films were optimized by utilizing AlN buffer layers grown on top of the Si substrate 22 .…”
Section: Samples Preparation and Characterizationmentioning
confidence: 99%
“…This highly controllable process provides superior thickness and stoichiometric uniformity and an atomically smooth surface 25 , 26 as compared to chemical vapor deposition, the standard technique used to grow NbTiN films 27 . We used NbCl 5 , TiCl 4 , and NH 3 as gaseous reactants; the stoichiometry was tuned by varying the ratio of TiCl 4 /NbCl 5 cycles during growth 28 . The superconducting properties of these ultrathin NbTiN films were optimized by utilizing AlN buffer layers grown on top of the Si substrate 29 .…”
Section: Sample Preparationmentioning
confidence: 99%