Investigations on tip-based large area nanofabrication and nanometrology using a planar nanopositioning machine (NFM-100)

Abstract

This paper explores large area application of tip-based nanofabrication by field emission scanning probe lithography and showcases the simultaneous possibility of atomic force microscopy on macroscopic scales. This is made possible by the combination of tip-based technology and a planar nanopositioning and nanomeasuring machine. Using long range atomic force microscopy measurement of regular grating structures, the performance of the machine is thoroughly characterized over the full 100 mm range of motion of the positioning machine, which was confirmed by repeated measurements. After initially focussing on achieving the minimum line width of < 40 nm in microscopic areas, a grating with a pitch of 1 μm is additionally fabricated over a total length of 10 mm, whereby the dimensions and deviations are also considered.

Precision measurement and engineering at the 60th Ilmenau Scientific Colloquium

“…In a further joint paper by NIST and TU Ilmenau, Schulze et al [2] propose the use of an electrostatic force balance to improve the realization and dissemination of radionuclide activity. In the area of nanometrology and nanofabrication, the paper by Stauffenberg et al [3] highlights the opportunity for tip-based nanofabrication of local features on large-area substrates using nanopositioning and nanomeasuring machines. Furthermore, innovative use of fluid force microscopy for mask-free nanoprinting of structures that are used to interface with biological targets, such as platelets, is presented by Soter et al [4].…”