Investigations on the influence of process parameters on the structural evolution of ion beam sputter deposited chromium thin films

Abstract

Chromium thin films are technologically important as underlayers for the deposition of cobalt-based magnetic films because of their good lattice match and adhesion. The structural orientation and morphology of the chromium under layers control the magnetic properties of the cobalt-based films deposited on them. Hence, optimization of the structure and properties of chromium under layers is essential for realizing magnetic thin films with desired properties. In this paper, we report the structural variation observed in chromium thin films deposited on silicon(1 0 0) substrates deposited using Ion Beam Sputter Deposition (IBSD) technique. The influence of process parameters, such as ion beam current density, substrate temperature and the angle of incidence of the condensing species, on the structural transformation from (1 1 0) orientation to (2 0 0) orientation has been presented. The structural variation and morphological variations observed have been discussed based on the growth models and the energetics involved in the process.

Picosecond Ultrasonics for Studying Elastic Modulus of Polycrystalline Chromium Nanofilms: Thickness Dependence and Stiffness Enhancement

“…Chromium (Cr) films are widely used in various engineering applications as an adhesive layer [1], thermal diffusion barrier [2], solar absorber [3], and plasmonic sensor [4]. It is generally known that the properties of thin films are different from those of bulk materials.…”

“…It is generally known that the properties of thin films are different from those of bulk materials. Many scientists have studied the structural variation, morphological variation, optical constants, and electrical properties of Cr films using a series of testing techniques such as X-ray diffraction (XRD) [1,2,5], scanning electron microscope (SEM) [1,4], and atomic force microscopy (AFM) [3]. As we know, few studies about the elasticity of Cr films have been reported to date.…”

Properties of CrSi2 Layers Obtained by Rapid Heat Treatment of Cr Film on Silicon

“…The chromium thin films (thick up to 200 nm) are widely applied as durable conductive coatings and contact pads in microelectronics and sensors [ 4 , 5 ]. Chromium can be applied as the underlayer material for the multipurpose coatings in the microelectronic devices and microsensor products on silicon and glass [ 6 , 7 , 8 ], where its morphology is important, as it determines the structure and properties of the subsequent functional layer [ 9 ]. In this case, chromium promotes the crystallization extent of the upper layer, increases the grain size and increases the Hall ratio and the concentration of carriers owing to the suppression of Na atom diffusion into the films (for glass) and reduces resistance.…”