Investigations on the effect of process parameters on the growth of vertically oriented graphene sheet in plasma‐enhanced chemical vapour deposition system
Abstract:A multistage numerical model comprising the plasma kinetics and surface deposition sub-models is developed to study the influence of process parameters, namely, total gas pressure and input plasma power on the plasma chemistry and growth characteristics of vertically oriented graphene sheets (VOGS) grown in the plasma-enhanced chemical vapour deposition system containing the Ar + H 2 + C 2 H 2 reactive gas mixture. The spectral and spatial distributions of temperature and number densities, respectively, of pla… Show more
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