Investigations of the development rate of irradiated PMMA microstructures in deep X-ray lithography

Meyer, Pascal; El-Kholi, A.; Schulz, Joachim

doi:10.1016/s0167-9317(02)00547-6

Cited by 32 publications

(15 citation statements)

References 12 publications

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“…It has been shown by several authors (Mappes et al 2006;Meyer et al 2002b;Meyer et al 1999) that the rate of development for PMMA is:…”

Section: Resist Developmentmentioning

confidence: 99%

Linewidth design rules for microstructures manufactured in PMMA resist using X-ray LIGA

Lawes

2009

Microsyst Technol

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During the past decade, individual simulation modules for the LIGA process have been developed, such as the power spectrum of the X-rays available from a given synchrotron, the effect of various components in the beam line, the image structure in the resist and image development. This has lead to an understanding of the parameters affecting the basic dimensional relationship between the mask and the 3D image in the resist itself. The commercialization of X-ray LIGA now requires knowledge of the parameters affecting the production engineering of micro devices. Foremost among these parameters are the manufacturing tolerances arising from variations in key microfabrication steps. This paper seeks to integrate the various physical simulation models into a single interactive program, whereby the design engineer can see the effect of different synchrotron output spectra, different beamline constructions and different resist parameters on the dimensions of the planned 3D microstructure. A novel approach to estimating the dimensional tolerances to be expected with large scale production is developed and comparison made with data available from the literature. Predicted results from using a particular synchrotron with a beamline designed to approximate to a ''standard'' exposure spectra at the rest surface are calculated, showing the microstructure shape and tolerance expected in large scale production. From these data a basic set of equations are established from which ''Linewidth Design rules for LIGA'' can be established. The steps following definition of the resist structure, for example electrodeposition, injection moulding or hot embossing, are not studied here.

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“…It has been shown by several authors (Mappes et al 2006;Meyer et al 2002b;Meyer et al 1999) that the rate of development for PMMA is:…”

Section: Resist Developmentmentioning

confidence: 99%

Linewidth design rules for microstructures manufactured in PMMA resist using X-ray LIGA

Lawes

2009

Microsyst Technol

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show abstract

“…Important parameters are stress levels or annealing behavior for applications where heat or higher temperatures are involved. The applied electroplating procedures used in the LIGA process chain are gold plating for X-ray mask fabrication and nickel plating for molding tools [13] and metallic micro components. Further alloys may be deposited in resist molds such as, Ni-Co or Ni-Fe.…”

Section: Micro-electroplating Technologymentioning

confidence: 99%

MODULIGA: The LIGA process as a modular production method-current standardization status in Germany

Hahn¹,

Meyer²,

Bade³

et al. 2005

Microsyst Technol

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“…The development process [8] used for the PMMA positive resist uses the GG developer, a first rinse in BDG and lastly the substrate is rinsed in DI water and dried. Developing time depends systematically on the resist system, resist thickness, exposure parameters and developer temperature.…”

Section: Exposure and Developmentmentioning

confidence: 99%

Ensuring repeatability in LIGA mold insert fabrication

Schulz¹,

Bade²,

Guttmann³

et al. 2004

Microsystem Technologies

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As of today, four products with LIGA parts are commercially available: microParts' spectrometer, mechanical drives by micromotion and Faulhaber and an optical fiber connector by Spinner. This indicates that LIGA technology is advancing from a pace-making technology to a key technology for microsystems fabrication. This success was made possible in part by a consistent focus on making the technology reliable. In general, the key technical issues for yield enhancement can be categorized as follows: finding and qualifying external suppliers; modifying processes to reduce handling; finding ways to monitor each machine involved; establishing quality specifications between the process steps; and last but not least improving the understanding of each process step. We give examples for all of these issues.

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Investigations of the development rate of irradiated PMMA microstructures in deep X-ray lithography

Cited by 32 publications

References 12 publications

Linewidth design rules for microstructures manufactured in PMMA resist using X-ray LIGA

Linewidth design rules for microstructures manufactured in PMMA resist using X-ray LIGA

MODULIGA: The LIGA process as a modular production method-current standardization status in Germany

Ensuring repeatability in LIGA mold insert fabrication

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