2023
DOI: 10.3390/mi14030566
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Investigations of Sidewall Passivation Using the Sol-Gel Method on the Optoelectronic Performance for Blue InGaN Micro-LEDs

Abstract: The optoelectronic effects of sidewall passivation on micro-light-emitting diodes (Micro-LEDs) were investigated using sol-gel chemical synthesis. Blue InGaN/GaN multi-quantum well (MQW) Micro-LEDs, ranging in size from 20 × 20 μm to 100 × 100 μm and with high EQE, were fabricated and distinguished by the passivation method used, including no passivation, sol-gel SiO2, and plasma-enhanced chemical vapor deposition (PECVD) SiO2. Impressively, the sol-gel method is advantageous in improving the optoelectronic pe… Show more

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Cited by 4 publications
(2 citation statements)
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“…Different sizes of hollow cylindrical Micro-LEDs patterns were constructed through lithography by Micro Writer ML3 and then it was dry-etched by ICP using SiO2 as a hard mask. After cleaning the mask with buffered HF (BOE), 110 nm indium-tin oxide (ITO) was deposited on the ring-shaped p-GaN via magnetron sputtering and annealed at 600 °C with 80% N2 and 20% O2 for 5 min using rapid thermal annealing to achieve ohmic contact [9]. Then, 50 nm Al2O3 sidewall passivation was performed by thermal ALD at 300 ℃.…”
Section: Methodsmentioning
confidence: 99%
“…Different sizes of hollow cylindrical Micro-LEDs patterns were constructed through lithography by Micro Writer ML3 and then it was dry-etched by ICP using SiO2 as a hard mask. After cleaning the mask with buffered HF (BOE), 110 nm indium-tin oxide (ITO) was deposited on the ring-shaped p-GaN via magnetron sputtering and annealed at 600 °C with 80% N2 and 20% O2 for 5 min using rapid thermal annealing to achieve ohmic contact [9]. Then, 50 nm Al2O3 sidewall passivation was performed by thermal ALD at 300 ℃.…”
Section: Methodsmentioning
confidence: 99%
“…50 In addition, a low-temperature sol-gel process has been reported to be able to minimize the generation of defects during the sidewall passivation process. 75,93 For InGaN/GaN-based blue nano-LED arrays, device performance with sol-gel SiO 2 passivation was compared with that of PECVD SiO 2 passivation. 75 EQEs were obtained from 60 pixels, with each pixel consisting of 6-9 nanorods (diameter: 580 nm) fabricated with different forms of SiO 2 passivation.…”
Section: Effective Passivation Of Sidewall Surfacementioning
confidence: 99%