Investigations of Matrix-Exposure Lithography Using Stacked Linear Arrays of Squared Optical Fibers

Horiuchi, Toshiyuki; Watanabe, Jun; Iwasaki, Jun-ya; Kobayashi, Hiroshi

doi:10.2494/photopolymer.34.27

Cited by 1 publication

(2 citation statements)

References 14 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…It was clarified in our past research that the focal depth of the optics was more than 5 mm, and that patterning on curved surfaces using a flat reticle was probably feasible if the distortion and intensity distribution were appropriately compensated. 40) It is thought that patterning on curved surfaces using a flat reticle is far more convenient than patterning using a curved reticle with the same shape. This would be the best way to compensate the distortion, homogenize the image intensity of the specimen surface, and consider the curvature shape of the specimen surface synthetically by the reticle pattern modification and the control of the illumination intensity distribution.…”

Section: Discussionmentioning

confidence: 99%

“…[36][37][38] As a result, patterns on curved reticles were successfully replicated on curved specimen surfaces. 39,40) However, the shapes of the replicated patterns on the curved specimens were slightly different from the original ones on the reticle. For this reason, pattern shape distortions caused by the parabolic mirror optics composed of a pair of paraboloids of revolution were investigated 41) using a flat reticle and wafers.…”

Section: Introductionmentioning

confidence: 96%

See 1 more Smart Citation

Distortions of parabolic mirror optics for stereophonic lithography and prospects of compensations

Horiuchi,

Iwasaki,

Kobayashi

2024

Jpn. J. Appl. Phys.

View full text Add to dashboard Cite

The distortions of parabolic mirror optics used for stereophonic projection lithography were investigated. It has already been demonstrated that resist patterns are replicable on gently curved surfaces using mirror optics composed of faced paraboloids of revolution. However, it was found that replicated resist patterns were somewhat distorted from the original patterns. The distortions were caused by characteristics of projection optics. For this reason, the distortions were first calculated by tracing light rays. The calculation procedures are explained in detail. The calculated distortions almost coincide with the ones obtained by experiments. Next, the influences of distortions on the distributions of image intensity and replicated pattern widths were investigated. The maximum distortions reached 29% of the original size at the right-side corners of a 12 mm square, and the light intensity was lowered by 30%. For this reason, printed 200 μm pattern widths reached more than 500 μm on the right side. This was considered to be unfavorable for applying the method universally in various uses. For this reason, methods for compensating or modifying the optics distortions were investigated, and light intensity distributions were discussed.

show abstract

Section: Discussionmentioning

confidence: 99%