Investigations of Beams Emittance of a Hollow Cathode Ion Source

Abstract

A very thin Al film (thickness: 160-430 Å) was evaporated on a silicon wafer substrate with a SiO 2 film and an arachidic acid Langmuir-Blodgett film. Vanishing of resistance and a repulsive force indicating diamagnetism were observed in the very thin Al film in a magnetic field at room temperature. This repulsive force was measured by an apparatus which can measure small displacements such as 10 −2 µm with a laser beam.KEYWORDS: very thin Al film, vanishing of resistance, diamagnetism, room temperature, measuring apparatus of very small displacement L 426