Investigation on the ZnO:N films grown on (0001) and (0001¯) ZnO templates by plasma-assisted molecular beam epitaxy

Park, S.H.; Chang, Jae-Soo; Minegishi, Tsutomu; Park, J.S.; Im, Il; Itô, Masayuki; Taishi, Toshinori; Hong, Sung–Kwon; Oh, D. C.; Cho, M.W.; Yao, Takafumi

doi:10.1016/j.jcrysgro.2008.11.018

Cited by 15 publications

(9 citation statements)

References 24 publications

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“…The influence of photocatalytic activity by crystal face exposition is observed by other authors [77][78][79]. [44,45] The specific surface area (SSA) of ZnOm is higher than ZnO:Nm sample, promoting the increase in photocatalytic activity under UV illumination.…”

Section: Consequently [As] Is Incorporated Into Kinetic Rate (K) Thmentioning

confidence: 81%

“…Theoretical calculations point out that N is the best superficial acceptor candidate for ZnO [42] while Amiri et al [43] have analyzed the possible source of ferromagnetism in ZnO:N compounds by using ab-initio calculations. ZnO:N has been obtained by different routes, such as pulse laser deposition [44], molecular beam epitaxy [45], ion beam deposition [46] and sputtering [47][48][49]. Herring et al [50] point out the synthesis of N-doped ZnO (ZnO:N) nanostructures through two different microwave irradiation methods which could control ZnO:N morphology and doping level.…”

Section: Introductionmentioning

confidence: 99%

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The interplay between morphology and photocatalytic activity in ZnO and N-doped ZnO crystals

et al. 2017

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Photocatalytic materials can perform oxidative and reductive reactions over their surfaces when excited with light. Intrinsic characteristics of the material such as superficial area, morphological structure, and crystalline phase exposition play a fundamental role in the corresponding reaction paths. However, especially in doped semiconductors, as ZnO:N, less is known about how the synthesis parameters affect the morphologies and the photocatalytic activity simultaneously. To solve this issue, ZnO and ZnO:N samples were obtained using microwave-assisted hydrothermal and modified polymeric precursor methods of synthesis. Samples morphologies were characterized by TEM and FE-SEM. Crystallographic phases were observed by XRD and optical characteristics by DRS. XPS results confirmed the doping process. Degradation of Rhodamine-B and Cr(VI) reduction were employed as probe reactions to investigate their photocatalytic activity. Although the crystallographic structure of these powders maintains the ZnO hexagonal wurtzite structure, the optical properties and morphologies, and photocatalytic activities present different behaviors. Also, density functional theory calculations were employed to determine the specific features related to electronic structure, morphology, and photocatalytic activity.Different synthesis methods produce a singular behavior in the physicochemical properties of materials, and the doping effect produces various modifications in RhB degradation and Cr(VI) reduction for each synthesis method. Crystal face exposition and morphologies are related to the improvement in the photocatalytic activity of the materials.

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Section: Consequently [As] Is Incorporated Into Kinetic Rate (K) Thmentioning

confidence: 81%

Section: Introductionmentioning

confidence: 99%

The interplay between morphology and photocatalytic activity in ZnO and N-doped ZnO crystals

et al. 2017

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“…Many thin film preparation techniques have been applied in the synthesis of p-type ZnO films including a molecular beam epitaxy [18], metal organic chemical vapor deposition [4], magnetron sputtering [10], pulsed laser deposition [19], sol gel processing [2] and so on. It is known that good quality dense carbon coatings are produced by filtered cathodic vacuum arc (FCVA) technique.…”

Section: Introductionmentioning

confidence: 99%

Structural, optical and electrical properties of N-doped ZnO thin films prepared by thermal oxidation of pulsed filtered cathodic vacuum arc deposited ZnxNy films

Erdogan

Kara

Ozdamar

et al. 2011

Journal of Alloys and Compounds

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“…As reported in the literature, the ZnO thin films have been prepared by various techniques, such as sol-gel [6] , Chemical Vapor Deposition (CVD) [7,8] , Molecular Beam Epitaxy (MBE) [9,10] , Pulsed Laser Deposition (PLD) [11] and Magnetron Sputtering (MS) [12][13][14][15][16][17][18][19][20] . Regardless of sample preparation, the MS technique is believed to be one of the most efficient methods because of the high product ability and the easily controllable.…”

Section: Introductionmentioning

confidence: 99%

Effects of Deposition Temperature on the Properties of ZnO Films Grown by High Power Impulse Magnetron Sputtering

Yuan¹,

Internationals²

2017

JNMS

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Investigation on the ZnO:N films grown on (0001) and (0001¯) ZnO templates by plasma-assisted molecular beam epitaxy

Cited by 15 publications

References 24 publications

The interplay between morphology and photocatalytic activity in ZnO and N-doped ZnO crystals

The interplay between morphology and photocatalytic activity in ZnO and N-doped ZnO crystals

Structural, optical and electrical properties of N-doped ZnO thin films prepared by thermal oxidation of pulsed filtered cathodic vacuum arc deposited ZnxNy films

Effects of Deposition Temperature on the Properties of ZnO Films Grown by High Power Impulse Magnetron Sputtering

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