Investigation on the static recording characteristic of super-resolution near-field structure with antimony mask layer

Feng, Zhaochi; Xu, Wendong; Wang, Yang; Gan, Fuxi

doi:10.1016/j.ssc.2005.02.021

Cited by 5 publications

(2 citation statements)

References 11 publications

(15 reference statements)

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“…In the SR technique, a functional thin films or film structures are used to control the intensity profile of an incident laser spot so as to produce an aperture-like effect [2]. Antimony bismuth alloy film is one of important optical films in near field SR functional film structure [3,4]. The alloy as mask layer has excellent beam shaping and concentrating performance.…”

Section: Introductionmentioning

confidence: 99%

Antimony Bismuth Alloy Films: Preparation, Optical and Thermal Properties

Wang

2010

MSF

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Antimony bismuth alloy films were deposited on Si and K9 glass substrates by magnetron-control sputtering method. The structure of the film was studied with x-ray diffraction (XRD). The thermal property of the film was researched by differential scanning calorimetry (DSC). The optical constants of the films including refractive index (n) and extinction coefficients (k) are measured by ellipsometry, and the dielectric constants (=r+ii), absorption coefficients  were also calculated.

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Section: Introductionmentioning

confidence: 99%

Antimony Bismuth Alloy Films: Preparation, Optical and Thermal Properties

Wang

2010

MSF

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“…However, its threshold laser power of super-resolution readout is generally ∼4 mW [5] , which is considerably higher than that of conventional discs (∼0.5 mW) [11] . Bismuth thin film with high nonlinear optical properties can concentrate energy into the center of a laser beam at low energy [12,13] . However, it is too sensitive to control.…”

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Optical characterization of antimony-based bismuth-doped thin films with different annealing temperatures

Wang

et al. 2011

中国光学快报

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Antimony-based bismuth-doped thin film, a new kind of super-resolution mask layer, is prepared by magnetron sputtering. The structures and optical constants of the thin films before and after annealing are examined in detail. The as-deposited film is mainly in an amorphous state. After annealing at 170-370• C, it is converted to the rhombohedral-type of structure. The extent of crystallization increased with the annealing temperature. When the thin film is annealed, its refractive index decreased in the most visible region, whereas the extinction coefficient and reflectivity are markedly increased. The results indicate that the optical parameters of the film strongly depend on its microstructure and the bonding of the atoms.

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