Investigation of Viton O-Ring Performance for the SABRE Dark Matter Experiment

Rahman, Md. Shahinur; Hutchison, W. D.; Bignell, L. J.; Lane, G. J.; Timmers, H.

doi:10.1007/s11665-020-05259-x

Cited by 4 publications

(1 citation statement)

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“…The FE-SEM is a well-established technique to analyze sur-face morphology for better insights into surface structure, grain size, roughness, and defects [24]- [28]. The FE-SEM images of Al films deposited at varying sputtering power (80 W, 100 W, and 200 W) are shown in Fig.…”

Section: E Surface Morphology and Structural Characterizationmentioning

confidence: 99%

Synthesis of Al Thin Films with High Optical Transmittance by DC Magnetron Sputtering Process Parameter Optimization

Rahman

Lee²,

Uddin³

et al. 2023

EJENG

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Nanostructured Al thin film with higher optical transmittance and electrical conductivity has intensive applications in solar cells and optical and microelectronic devices. This experimental-based research study has optimized the DC magnetron sputtering deposition parameters (sputtering power, sputtering current, voltage, and working gas pressure) for Al thin film deposition to obtain the highest optical transmittance and lower sheet resistance. Optical transmittance, surface roughness, film thickness, sheet resistance, grain size, and surface morphology were characterized using UV-vis-NIR spectroscopy, surface profiler, spectroscopic ellipsometry, four-point probe, and FE-SEM, respectively to determine the effects of sputtering process parameters on Al films’ different properties. Experimental investigations reveal that electrical conductivity, surface roughness, grain size, and deposition rate increase with increasing of sputtering power at certain working gas pressure. At the optimized condition (sputtering power 80 W, working gas pressure 5 mTorr, deposition time 5 min and ambient temperature), the relatively higher optical transmittance in visible region 96%, moderate sheet resistance 0.196 ohm/square and lowest average surface roughness 2.86 nm were obtained for Al thin film. After all, this research study will help to understand the best Al film deposition parameters in terms of optical transmittance and electrical conductivity for future research and industrial applications.

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Section: E Surface Morphology and Structural Characterizationmentioning

confidence: 99%