Investigation of UV-laser induced metallization: Platinum from Pt (PF3)4

Low-Energy Electron-Induced Decomposition and Reactions of Adsorbed Tetrakis(trifluorophosphine)platinum [Pt(PF3)4]

“…Thus, we postulate that the surface-bound tetrakis(trifluorophosphine)platinum transition-metal complex undergoes a similar initial decomposition step, with the only difference being the almost certain and rapid charge neutralization of the surface-bound Pt(PF 3 ) 3 – anion on a conducting substrate. It also seems likely that a single PtPF 3 bond-cleavage event represents the first elementary reaction step involved in UV-laser metallization studies using Pt(PF 3 ) 4 , because low-energy electrons are presumed to play an essential role in initiating deposition in this process …”

“…Perhaps the most important class of EBID materials, with potential applications ranging from nanowires to biosensors, is that of metallic nanostructures created from volatile organometallic precursors. − Within this category, platinum-containing EBID precursors are among the most widely used, particularly trimethyl(methylcyclopentadienyl) platinum(IV) (MeCpPtMe 3 ), which has been used to create nanowires and local contact points for carbon nanotubes. − However, one of the limitations of deposits grown using MeCpPtMe 3 is the often unacceptably high degree of carbon contamination, which negatively impacts conductivity. − In an attempt to overcome the deleterious effects of carbon contamination, a number of deposition experiments have been performed using the carbon-free EBID platinum precursor tetrakis(trifluorophosphine)platinum [Pt(PF 3 ) 4 ]. − This high-vapor-pressure liquid (68 Torr at 20 °C) has already been used in chemical vapor deposition (CVD) to create pure platinum films on a variety of heated (200–300 °C) substrates and in selective-area deposition of platinum silicide on Si(100) . Pt(PF 3 ) 4 has also been used in UV-laser-induced metallization studies, where deposition has been ascribed to dissociative electron capture involving low-energy electrons produced by laser–surface interactions . A comparison of EBID structures generated from Pt(PF 3 ) 4 and MeCpPtMe 3 reveals the advantages of using Pt(PF 3 ) 4 .…”

Substrate temperature and electron fluence effects on metallic films created by electron beam induced deposition

“…The choice of these three molecules was predicated on their widespread use by the EBID community as precursors, and our understanding of the purely electron stimulated decomposition process. 7,8,10,11,16,19,[21][22][23][24][25][26][27][28][29][30][31][32] In addition, our results can be compared and benchmarked against compositional data that already exist from previous EBID studies where deposition was accomplished under more typical conditions. Our experimental approach involved exposing nanometer thick films of parent precursor molecules to different electron fluences.…”

Deposition of Highly Porous Nanocrystalline Platinum on Functionalized Substrates Through Fluorine‐Induced Decomposition of Pt(PF3)4 Adsorbates

“…The corresponding maximum local pressures at the substrate surface were approximately three orders of magnitude greater than the background pressures . Pt(PF 3 ) 4 has previously been used as a precursor for chemical vapor deposition, laser beam deposition, and EBID . EBID was performed using a 5 keV, 3.4 nA electron beam.…”

“…Most favorable properties arise from a combination of high catalytic activity and large surface‐to‐volume ratio. Pt synthesis methods include chemical reduction (e.g., electrochemical, photochemical, sono‐chemical, and radiolytic), thermal decomposition, ligand displacement from organometallics, hydrothermal growth, the sol–gel process, gas‐mediated electron‐, ion‐, and laser‐ beam‐induced deposition, laser ablation, chemical vapor deposition, and thermal evaporation. Porous platinum may also be produced using dealloying methods and by chemical plating or physical vapor deposition onto a pre‐existing, high porosity framework.…”