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2017
DOI: 10.1063/1.4979855
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Investigation of the radially resolved oxygen dissociation degree and local mean electron energy in oxygen plasmas in contact with different surface materials

Abstract: Energy Resolved Actinometry is applied to simultaneously measure the radially resolved oxygen dissociation degree and local mean electron energy in a low-pressure capacitively coupled radio-frequency oxygen plasma with an argon tracer gas admixture. For this purpose, the excitation dynamics of three excited states, namely, Ar(2p1), O(3p3P), and O(3p5P), were determined from their optical emission at 750.46 nm, 777.4 nm, and 844.6 nm using Phase Resolved Optical Emission Spectroscopy (PROES). Both copper and si… Show more

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Cited by 21 publications
(21 citation statements)
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“…Frequently, these cross sections are not part of the complete set. An example is the calculation of the electron impact rate coefficients required to interpret actinometry measurements [185,186].…”
Section: Electron Impact Collisionsmentioning
confidence: 99%
“…Frequently, these cross sections are not part of the complete set. An example is the calculation of the electron impact rate coefficients required to interpret actinometry measurements [185,186].…”
Section: Electron Impact Collisionsmentioning
confidence: 99%
“…, where k O de is calculated with equation (2) with the corresponding cross section. Rearranging the different terms and using argon as actinometer, the O atom density can be obtained from the expression [67]:…”
Section: Principlesmentioning
confidence: 99%
“…The foremost advantage of this method is that it remains unaffected by deposition or etching conditions as long as the optical access is clean. To this end, different approaches such as the trace of a rare gas (TRG) OES 31,32 using the mixture of Ar/He/Ne/Xe to the process gases, optical 33 and energy 34 resolved actinometry, and rotational spectroscopy of N 2 35,36 have been used for the determination of T e , n e , T g , and F atom concentration in the plasma etching of SiO 2 at low-pressure discharges. However, during the actual plasma process, the experimental gas contains no mixed gas of Ar/He/Ne/Xe.…”
Section: Introductionmentioning
confidence: 99%