Investigation of the Impact of Ferroelectricity Boosted Gate Stacks for 3D NAND on Short Time Data Retention and Endurance

Higashi, Y.; Bastos, J. P.; Chasin, A.; Breuil, L.; Arreghini, A.; Ramesh, S.; Rachidi, S.; Jeong, Y.; Van den bosch, G.; Rosmeulen, M.

doi:10.1109/irps48228.2024.10529409

2024 IEEE International Reliability Physics Symposium (IRPS) 2024

DOI: 10.1109/irps48228.2024.10529409

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Investigation of the Impact of Ferroelectricity Boosted Gate Stacks for 3D NAND on Short Time Data Retention and Endurance

Y. Higashi,

J. P. Bastos,

A. Chasin

et al.

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Investigation of the Impact of Ferroelectricity Boosted Gate Stacks for 3D NAND on Short Time Data Retention and Endurance

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References 18 publications

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