2021
DOI: 10.1080/00150193.2021.1888233
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Investigation of the barium strontium titanate films on the silicon substrate

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Cited by 4 publications
(6 citation statements)
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“…The second sample had the same thickness and composition, but with a sublayer of the same film with a thickness of 2.5 nm and deposited on a silicon substrate. The substrate was the single crystal p-type silicon with a resistivity of 12 Ohm/cm and crystallographic orientation (001) [ 42 ]. The third sample was an 800 nm thick BST film on a (111)-oriented MgO substrate.…”
Section: Methodsmentioning
confidence: 99%
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“…The second sample had the same thickness and composition, but with a sublayer of the same film with a thickness of 2.5 nm and deposited on a silicon substrate. The substrate was the single crystal p-type silicon with a resistivity of 12 Ohm/cm and crystallographic orientation (001) [ 42 ]. The third sample was an 800 nm thick BST film on a (111)-oriented MgO substrate.…”
Section: Methodsmentioning
confidence: 99%
“…The third sample was an 800 nm thick BST film on a (111)-oriented MgO substrate. The sample fabrication processes are described in more detail in [ 35 , 40 , 42 ]. The film thickness was measured using an MII-4 microinterferometer and also a Zeiss Supra-25 scanning electron microscope in the “cross-section” and AFM image of the end face of the etched film.…”
Section: Methodsmentioning
confidence: 99%
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“…The third sample was an 800 nm thick BST film on a (111)-oriented MgO substrate. The sample fabrication processes are described in more detail in [35,40,42]. The film thickness was measured using an MII-4 microinterferometer and also a Zeiss Supra-25 scanning electron microscope in the "crosssection" and AFM image of the end face of the etched film.…”
Section: Methodsmentioning
confidence: 99%
“…Dari berapa penelitian juga melaporkan suhu yang digunakan hingga 1300 o C [22][23][24][25] . Beberapa penelitian melaporakan bahwa metode ini menghasilkan banyak sekali algomerasi dengan ukuran butir pada rentang 2-5 µm dan impuritas yang tinggi yang menyebabkan buruknya sifat listrik dari material yang dihasilkan dari metode ini [26][27][28][29][30][31][32] .…”
Section: Metode Solid State Reactionunclassified