2023
DOI: 10.55696/ejset.1297942
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Investigation of Structural, Optical, and Electrical Properties of Ito Films Deposited at Different Plasma Powers: Enhanced Performance and Efficiency in SHJ Solar Cells

Abstract: In this article, the structural, optical, and electrical properties of Indium Tin Oxide (ITO) films deposited at different plasma powers were investigated. The transmittance values in the visible region were measured, revealing that the ITO film deposited at 2050 W exhibited the highest transmittance (81%). Additionally, the sheet resistance values of all films were analyzed, indicating that the ITO film deposited at 2050 W had the lowest sheet resistance (64.9 Ω/sq). Through XRD analysis, the structural prope… Show more

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Cited by 2 publications
(2 citation statements)
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“…After coating the p-type a-Si: H layer, the front surface coatings were completed with the deposition of ITO films at different temperatures. Finally, finger and busbar patterns were printed on the front surface of the HJT solar cells using Ag paste via the screen print method (ASM Assembly Systems, Munich, Germany), and the solar cell was completed by firing it at 200 °C for 10 min [ 28 , 29 ]. Figure 1 a provides a schematic representation and eV diagram [ 30 ] of the HJT solar cell.…”
Section: Methodsmentioning
confidence: 99%
“…After coating the p-type a-Si: H layer, the front surface coatings were completed with the deposition of ITO films at different temperatures. Finally, finger and busbar patterns were printed on the front surface of the HJT solar cells using Ag paste via the screen print method (ASM Assembly Systems, Munich, Germany), and the solar cell was completed by firing it at 200 °C for 10 min [ 28 , 29 ]. Figure 1 a provides a schematic representation and eV diagram [ 30 ] of the HJT solar cell.…”
Section: Methodsmentioning
confidence: 99%
“…Of these techniques, magnetron sputtering is widely employed due to its low substrate temperatures and high accumulation rates, as well as its suitability for industrial applications and its ability to ensure the excellent optoelectronic performance of the film [4,7]. The most widely utilized TCO films include indium tin oxide (ITO) [20][21][22], indium zinc oxide (IZO) [23], aluminum zinc oxide (AZO) [24], fluorine tin oxide (FTO) [25], gallium zinc oxide (GZO) [26], molybdenum zinc oxide MZO [27], and tungsten oxide (WO 3 ) [28,29]. The III-group element Indium is the most effective dopant material among these TCO films owing to its ease of processing, resistance to oxidation, and low reactivity [30].…”
Section: Introductionmentioning
confidence: 99%