Investigation of sputter-deposited TiO2 thin film for the fabrication of dye-sensitized solar cells

Hossain, M. F.; Biswas, S.; Takahashi, T.; Kubota, Yoshinobu; Fujishima, Akira

doi:10.1016/j.tsf.2007.12.022

Cited by 48 publications

(22 citation statements)

References 22 publications

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“…A relative high current density has been obtained for a 3 m thickness TiO 2 nanorod arrays, as shown in Figure 8, comparing to the results obtained by sputtering technique in the literature. [12][13][14][15][16][17][18][19] A short-circuit photocurrent density (J sc of 12.76 mA/cm 2 , an open-circuit voltage (V oc of 0.65 V, a fill factor (FF) of 0.63 and a photoelectron conversion efficiency ( of 5.25% are obtained for the DSSC using this nanorod arrays as an electrode material. It is the highest conversion efficiency until now has been obtained for TiO 2 films prepared by sputtering technique without any post-deposition treatments.…”

Section: Resultsmentioning

confidence: 99%

Sputtered Highly Ordered TiO₂ Nanorod Arrays and Their Applications as the Electrode in Dye-Sensitized Solar Cells

Li¹,

Ma²,

Ying³

et al. 2011

j nanosci nanotechnol

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For the first time, the TiO 2 nanorod arrays have been prepared on ITO substrates at room temperature by dc reactive magnetron sputtering technique. These TiO 2 nanorods have a preferred orientation along the (220) direction and are perpendicular to the ITO substrate. Both the X-ray diffraction and Raman scattering measurements show that the highly ordered TiO 2 nanorod arrays have an anatase crystal structure. The diameter of the nanorod varies from 30 nm to 100 nm and the nanorod length can be varied from several hundred nanometers to several micrometers depending on the deposition time. The TiO 2 nanorod arrays with about 3 micrometers length have been used as an electrode for dye-sensitized solar cell (DSSC). Short-circuit photocurrent density, opencircuit voltage, fill factor and light-to-electricity conversion efficiency at 100 mW/cm 2 light intensity are estimated to be 12.76 mA/cm 2 , 0.65 V, 0.63 and 5.25%, respectively, for the DSSC made of the TiO 2 nanorods.

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Section: Resultsmentioning

confidence: 99%

Sputtered Highly Ordered TiO₂ Nanorod Arrays and Their Applications as the Electrode in Dye-Sensitized Solar Cells

Li¹,

Ma²,

Ying³

et al. 2011

j nanosci nanotechnol

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“…These properties were systematically varied by adjusting the following deposition parameters: deposition time, pressure, target current and substrate bias voltage. This in turn results in a higher deposition rate [24]. Fig.…”

Section: Resultsmentioning

confidence: 99%

“…This can be achieved by adjusting the amounts of dye and/or electrodes film thicknesses. In this work, the potential of magnetron sputtering as a technique for depositing [24] concluded that DSSC with TiO 2 electrode deposited at higher sputtering pressure exhibited an increase in photoelectron conversion efficiency. These findings led us to consider magnetron sputtering as a feasible technique for the preparation of NiO x coatings.…”

Section: Introductionmentioning

confidence: 92%

Deposition and characterization of NiOx coatings by magnetron sputtering for application in dye-sensitized solar cells

Awais

Rahman

MacElroy

et al. 2010

Surface and Coatings Technology

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Nickel oxide (NiO x ) due to its p-type nature has considerable potential as a photocathodic material in energy conversion devices such as dye-sensitized solar cells (DSSCs). However, NiO x has not been extensively used for this application mainly because of low light harvesting efficiency due to limited dye loading on the coatings. In this study NiO x coatings were deposited using the dc-magnetron sputtering technique from a nickel target in an argon/oxygen plasma. One of the advantages of magnetron sputtering is the ability to control 2 coating properties such as mechanical performance and chemical stoichiometry. It is anticipated that by enhancing the interconnectivity between NiO x particles and by optimizing surface roughness, it may be possible to enhance dye adsorption and increase its ability to absorb visible light. NiO x coatings were deposited onto both silicon wafer and indium tin oxide (ITO) covered glass substrates. The influence of deposition parameters such as pressure, nickel target current and substrate bias voltage were correlated with the coating properties of surface roughness, thickness, crystallographic structure and surface energy. This evaluation was carried out using optical profilometry, spectroscopic ellipsometry, XRD and contact angle measurements respectively. It was observed that deposited coating morphology and roughness were significantly influenced by the deposition parameters. For example increasing the deposition pressure from 0.20 to 0.40 Pa led to an increase in surface roughness (Ra) from 1.6 to 3 nm. Associated with this increase in roughness the surface energy increased from 36 to 61 mN/mm. The NiO x coatings were spectrally sensitized with Rucomplex dye containing -COOH groups as anchoring moieties. The dye adsorptions on NiO x coatings, deposited on ITO substrates, were investigated in transmission mode using UV-vis spectroscopy in the range of 400 -800 nm. It was observed that for the coatings with the highest surface energy, there was an increase of up to 60 % in the level of dye adsorption. The electroactivity of the NiO x thin films deposited on Ni substrate at 0.4 Pa has been verified through the occurrence of redox processes of reduction and lithium intercalation within the oxide film.

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“…Moreover, NiO x is considered as a model semiconductor substrate due to its wide band-gap energy range from 3.6 to 4.0 eV depending on the amount of Ni(III) sites [15]. NiO x films have been fabricated by various techniques which include spin coating, dipping, electrochemical deposition [17], magnetron sputtering [18][19][20] and sol-gel [21][22][23][24][25]. With the exception of electrochemical techniques, the other deposition methods require subsequent thermal treatments in order to enhance the density of the coatings [21][22][23][24][25][26], to obtain crystalline structure in the as deposited sputtered coatings [26] and to remove the binder in the case of sol-gel deposited coatings [21][22][23][24][25].…”

Section: Introductionmentioning

confidence: 99%

Application of a novel microwave plasma treatment for the sintering of nickel oxide coatings for use in dye-sensitized solar cells

Awais

Rahman

MacElroy

et al. 2011

Surface and Coatings Technology

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In this study the use of microwave plasma sintering of nickel oxide (NiO x ) particles for use as ptype photoelectrode coatings in dye-sensitized solar cells (DSSCs) is investigated. NiO x was chosen as the photocathode for this application due to its stability, wide band gap and p-type 2 nature. For high light conversion efficiency DSSCs require a mesoporous structure exhibiting a high surface area. This can be achieved by sintering particles of NiO x onto a conductive substrate. In this study the use of both 2.45 GHz microwave plasma and conventional furnace sintering were compared for the sintering of the NiO x particles. Coatings 1 to 2.5 µm thick were obtained from the sintered particles (mean particle size of 50 nm) on 3 mm thick fluorine-doped tin oxide (FTO) coated glass substrates. Both the furnace and microwave plasma sintering treatments were carried out at ~450 ºC over a 5 minute period. Dye sensitization was carried out using Erythrosin B and the UV-vis absorption spectra of the NiO x coatings were compared. A 44% increase in the level of dye adsorption was obtained for the microwave plasma sintered samples as compared to that obtained through furnace treatments. While the photovoltaic performance of the DSSC fabricated using the microwave plasma treated NiO x coatings exhibited a tenfold increase in the conversion efficiency in comparison to the furnace treated samples. This enhanced performance was associated with the difference in the mesoporous structure of the sintered NiO x coatings.

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Investigation of sputter-deposited TiO2 thin film for the fabrication of dye-sensitized solar cells

Cited by 48 publications

References 22 publications

Sputtered Highly Ordered TiO₂ Nanorod Arrays and Their Applications as the Electrode in Dye-Sensitized Solar Cells

Sputtered Highly Ordered TiO₂ Nanorod Arrays and Their Applications as the Electrode in Dye-Sensitized Solar Cells

Deposition and characterization of NiOx coatings by magnetron sputtering for application in dye-sensitized solar cells

Application of a novel microwave plasma treatment for the sintering of nickel oxide coatings for use in dye-sensitized solar cells

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Investigation of sputter-deposited TiO2 thin film for the fabrication of dye-sensitized solar cells

Cited by 48 publications

References 22 publications

Sputtered Highly Ordered TiO2 Nanorod Arrays and Their Applications as the Electrode in Dye-Sensitized Solar Cells

Sputtered Highly Ordered TiO2 Nanorod Arrays and Their Applications as the Electrode in Dye-Sensitized Solar Cells

Deposition and characterization of NiOx coatings by magnetron sputtering for application in dye-sensitized solar cells

Application of a novel microwave plasma treatment for the sintering of nickel oxide coatings for use in dye-sensitized solar cells

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Sputtered Highly Ordered TiO₂ Nanorod Arrays and Their Applications as the Electrode in Dye-Sensitized Solar Cells

Sputtered Highly Ordered TiO₂ Nanorod Arrays and Their Applications as the Electrode in Dye-Sensitized Solar Cells