2006
DOI: 10.1109/ted.2006.885099
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Investigation of self-heating effects in submicrometer GaN/AlGaN HEMTs using an electrothermal Monte Carlo method

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Cited by 80 publications
(57 citation statements)
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“…4. The hot spot is located next to the drain contact for all structures [11]. The shortest structure (L1) exhibits the highest lattice temperature peak of ~566 K, although a smaller voltage is applied than for other structures.…”
Section: Ease Of Use Algan/gan Tlm Heterostructures III Simulatimentioning
confidence: 97%
See 1 more Smart Citation
“…4. The hot spot is located next to the drain contact for all structures [11]. The shortest structure (L1) exhibits the highest lattice temperature peak of ~566 K, although a smaller voltage is applied than for other structures.…”
Section: Ease Of Use Algan/gan Tlm Heterostructures III Simulatimentioning
confidence: 97%
“…The inverse piezoelectric effect induced decrease in total polarization is caused by the additional stress imposed by the applied electric field on the drain contact. The decrease in total polarization in the heterostructure reduces a 2DEG in the channel, which would reduce the drain current of a transistor in on-conditions [10][11].…”
Section: Ease Of Use Algan/gan Tlm Heterostructures III Simulatimentioning
confidence: 99%
“…Quasi-equilibrium carrier distributions are assumed in the DD model, and hot carrier effects can be included only phenomenologically [5,6]. In this paper we use the ensemble Monte Carlo method, in which the semiclassical Boltzmann transport equation is solved by direct simulation of a large number of electrons and holes [16][17][18]. The most important equations for our MC simulation of LEDs are found in Ref.…”
Section: Theorymentioning
confidence: 99%
“…The coupling approach for a simple 2-D electrothermal model is described in [2]. Results are generated for an Al 0.15 Ga 0.85 N/GaN HFET with an n-type buffer (structure I) shown in .…”
Section: Simulation Method Results and Discussionmentioning
confidence: 99%
“…The gate width is 100µm. We apply the same thermal boundary conditions described in [2] at the die surfaces. In structures II and III, the number of electrons flowing into the GaN buffer is reduced.…”
Section: Simulation Method Results and Discussionmentioning
confidence: 99%