2022
DOI: 10.1016/j.ceramint.2022.04.038
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Investigation of oxygen deficiency-rich/oxygen deficiency-poor stacked TiO2 based resistive random access memory by mist chemical vapor deposition

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Cited by 7 publications
(1 citation statement)
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“…CVD has unique advantages, such as simple equipment and diverse precursors that allow the fabrication of continuous, compositionally controlled, homogeneous films [118]. Therefore, CVD is a powerful tool for synthesizing high-quality TiO 2 -based photocatalytic coatings on various substrate surfaces [119,120]. In a typical CVD process, there are two possible scenarios where the substrate is exposed to volatile precursors.…”
Section: Chemical Vapor Deposition (Cvd)mentioning
confidence: 99%
“…CVD has unique advantages, such as simple equipment and diverse precursors that allow the fabrication of continuous, compositionally controlled, homogeneous films [118]. Therefore, CVD is a powerful tool for synthesizing high-quality TiO 2 -based photocatalytic coatings on various substrate surfaces [119,120]. In a typical CVD process, there are two possible scenarios where the substrate is exposed to volatile precursors.…”
Section: Chemical Vapor Deposition (Cvd)mentioning
confidence: 99%