2022
DOI: 10.48048/tis.2022.5686
|View full text |Cite
|
Sign up to set email alerts
|

Investigation of Optical, Structural, Morphological and Electrical Properties of Electrodeposited Cobalt Doped Copper Selenide (Cu_(1-x) Co_x Se) Thin Films

Abstract: Undoped and cobalt doped copper selenide thin films have been successfully prepared unto fluorine tin oxide (FTO) substrates by electrodeposition method using copper acetate, cobalt nitrate and selenium (IV) oxide as precursors for copper, cobalt and selenium ions respectively. Deposited thin films were subjected to optical, structural, morphological, compositional and electrical analysis using spectrophotometer, x-ray diffractometer, scanning electron microscope (SEM), energy dispersive x-ray spectroscopy (ED… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...

Citation Types

0
0
0

Publication Types

Select...

Relationship

0
0

Authors

Journals

citations
Cited by 0 publications
references
References 37 publications
(42 reference statements)
0
0
0
Order By: Relevance

No citations

Set email alert for when this publication receives citations?