Investigation of optical properties of nickel oxide thin films deposited on different substrates

Influence of annealing temperature on structural and optical properties of nanocrystalline Platinum octaethylporphyrin (PtOEP) thin films

“…When absorption occurs, the reflective index is also affected. If the absorption is strong, it will cause a change in direction of reflective index and it will return to normal direction after the absorption drops back down to non-absorbing region [46]. This region of strong absorption is referred to as anomalous dispersion [2,[9][10][11]46].…”

“…If the absorption is strong, it will cause a change in direction of reflective index and it will return to normal direction after the absorption drops back down to non-absorbing region [46]. This region of strong absorption is referred to as anomalous dispersion [2,[9][10][11]46]. Tsuboi et al, they found the multi-Lorentz oscillator model would be much better than the four-oscillator model to study the optical constants for PtOEP emitting layer in singlelayer in (OLED) device and in thin film grown on quartz plate, but the multi-oscillator model makes the calculation more complicated because of too many parameters [12].…”

“…In addition, the decreasing in energy gap may be explained in term of the thermal energy generated by annealing which effected in delocalized p electrons and shift in the relative positions of the valence band (HOMO; p-orbitals) and conduction bands(LUMO; p * -orbitals) [9]. The velocity of propagation of electromagnetic wave through thin films is given by the frequencydependent complex refractive index N = n À jk where the real part (reflective index, n) is related to the velocity and provides information about electronic polarization [46,47]. While, the imaginary part (extinction coefficient, k) is related to the decay or damping of the oscillation amplitude of the incident electric field.…”

“…9) and the refractive index decreases slowly with increasing the wave length. This behavior is referred to the normal dispersion [46,49,50]. The refractive index in this region can be analyzed on by applying the single-oscillator model proposed by the Wemple and DiDomenico (WDD).…”

The effect of the oxygen ratio control of DC reactive magnetron sputtering on as-deposited non stoichiometric NiO thin films

“…But up to now, even if there are large amount of publications on the nickel oxide thin films, there are still many unclear properties and some understanding disparities among specific experimental results. All the deposition adjustable parameters, as for instance the different substrate materials [20], are still worthwhile to be further individually studied to advance understanding of the basic physics and chemistry and to promote the applications of the nickel oxide thin film materials.…”