Investigation of optical and electrical properties of TiO2, SiO2, and Ag single and multilayer thin films using spectroscopic ellipsometry and spectrophotometry methods: prepared by spin coating and DC magnetron sputtering
Hamid Entezarmahdi,
Hassan Sedghi
Abstract:In this work, spectroscopic ellipsometry was used to study the optical and electrical properties of TiO2 and SiO2 thin films deposited by spin-coating at different coating rotation speeds and annealed at various temperatures. In addition, Ag thin films of different thicknesses were deposited by DC magnetron sputtering at ambient temperature. In this method, the optical band gap for TiO2 thin films is between 2.4-3.25 eV, and for SiO2 thin films, it is between 3.2-3.6 eV.
The optical properties, includi… Show more
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